Presentation Information
[We-P-66]Utilization of Anisotropic Graphite for Thermal Distribution Control toward SiC Sublimation Growth with Higher Growth Rate
*Shigeyuki Kuboya1, Kazuma Eto1, Yukio Nagahata2, Takeshi Mitani1, Shunsuke Noguchi2, Yohei Fujikawa2, Kenji Momose2, Tomohisa Kato1 (1. National Institute of Advanced Industrial Science and Technology (AIST) (Japan), 2. Resonac Corporation (Japan))