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Photolithographic Quantum Dot Patterning Using Plasma-Induced Ligand Polymerization and Photoresist Mask

Emissive Materials and Components

The 31st International Display Workshops (IDW '24)

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[FMC3/PH3-4]Photolithographic Quantum Dot Patterning Using Plasma-Induced Ligand Polymerization and Photoresist Mask

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