Presentation Information
[FLXp1-01]Edge AI-Driven Optimization of Lateral CVD Growth of WS2 for Next-Generation TFT Materials
*Xiumei Lu1,3, Fei-Sheng Huang2, Yi-Zhen Yu3, Hung-Pin Hsu1, Zi-Yan Zhan3,1, Yu-Qi Tang3, Frank Huang4, Kazuto Nishikawa5, Tsung-Pei Chiang6, Ching-Wei Tung1, Jia-Hui Chen3, Ting-Zhen Chu3, Pei-Chun Chen3, Chen-Ling Tsai3, Hsin-Liang Lin3, Cheng-Wei Wang7, Wei-Tse Pai8, Junichi Takeya9, Yi-Ping Wang3,7 (1. Ming Chi University of Technology (Taiwan), 2. Taiwan Semiconductor Manufacturing Company (Taiwan), 3. National Taiwan University of Science and Technology (Taiwan), 4. Taiwan Denkei solution Corporation (Taiwan), 5. TechnoOptis Corporation (Japan), 6. Powerview Display Corporation (Taiwan), 7. Industrial Technology Research Institute (Taiwan), 8. Da-Yeh University (Taiwan), 9. The University of Tokyo (Japan))
Keywords:
Edge AI,WS2,CVD,TFT,Two-dimensional materials
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