Presentation Information
[1]Edge AI-Driven Optimization of Lateral CVD Growth of WS2 for Next-Generation TFT Materials
*Xiumei Lu1, Ziyan Zhan1, Yuqi Tang1, Frank Huang2, Kazuto Nishikawa3, Tsungpei Chiang4, JM Hung5, Chingwei Tung1, Yiping Wang6, Peichun Chen6, Chenling Tsai6, Junichi Takeya7, Hungpin Hsu1 (1. Ming Chi University of Technology (Taiwan), 2. Taiwan Denkei solution Corporation (Taiwan), 3. TOPCON Technohouse Corporation (Japan), 4. Powerview Display Corporation (Taiwan), 5. E Ink Holdings Incorporated (Taiwan), 6. National Taiwan University of Science and Technology (Taiwan), 7. The University of Tokyo (Japan))
Keywords:
Edge AI,WS2,CVD,TFT,Two-dimensional materials
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