Presentation Information
[FMCp1-7]Etch-Free Direct Patterning of Sol-Gel CuxO/IGZO Heterojunctions for Ternary Logic Circuits
*Seokhyeon Baek1, Sungjun Park1 (1. Ajou University (Korea))
Keywords:
metal oxide,solution process,direct patterning,heterojunction,ternary inverter
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