Presentation Information
[7]Etch-Free Direct Patterning of Sol-gel CuxO/IGZO Heterojunctions for Ternary Logic Circuits
*Seokhyeon Baek1, Sungjun Park1 (1. Ajou University (Korea))
Keywords:
metal oxide,solution process,direct patterning,heterojunction,ternary inverter
Comment
To browse or post comments, you must log in.Log in