Presentation Information

[7]Etch-Free Direct Patterning of Sol-gel CuxO/IGZO Heterojunctions for Ternary Logic Circuits

*Seokhyeon Baek1, Sungjun Park1 (1. Ajou University (Korea))

Keywords:

metal oxide,solution process,direct patterning,heterojunction,ternary inverter


Comment

To browse or post comments, you must log in.Log in