Presentation Information
[FMCp1-26L]Indium Tin Oxide Etch Characteristics Using CxH2x+2(x=1,2,3)/Ar
*Min Cheol Kim1, Jong Woo Hong1, Geun Yong Yeom1 (1. Sungkyunkwan University (SKKU) (Korea))
Keywords:
ITO,Dry etching,Hydrocarbon,CH4,C2H6,C3H8
Password required to view
To view or download the proceedings, please log into your A-Pass using the "Log in" button.
If you do not have a A-Pass, enter the password provided by the IDW Secretariat in the designated box and click the "Authenticate" button.
If you do not have a A-Pass, enter the password provided by the IDW Secretariat in the designated box and click the "Authenticate" button.
Log in
or
Comment
To browse or post comments, you must log in.Log in