Presentation Information
[FMCp1-26L]Indium Tin Oxide Etch Characteristics Using CxH2x+2(x=1,2,3)/Ar
*Min Cheol Kim1, Jong Woo Hong1, Geun Yong Yeom1 (1. Sungkyunkwan University (SKKU) (Korea))
Keywords:
ITO,Dry etching,Hydrocarbon,CH4,C2H6,C3H8
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