ad1.png

IDWHP

ad2.png

registration

ad3.png

spevent

IDW website

General Information

Registration

Announcements(0)

Timetable

Tue. Dec 2, 2025

Wed. Dec 3, 2025

Thu. Dec 4, 2025

Fri. Dec 5, 2025

Program

Keynote Address

Special Topics of Interest

Topical Sessions and Workshops

Special Events

Sessions

Search presentations

IDW25-confit.png

icon_20240718223423246.png

Profile management

Bookmark

Announcements

Download PDF for print

Special Topics

Program Type

Change account information such as the email address and password on the account setting screen common to Confit.

Login required to view

Password required to view

Presentation Information

Session Details

To view or download the proceedings, please log into your A-Pass using the "Log in" button.<br><br>If you do not have a A-Pass, enter the password provided by the IDW Secretariat in the designated box and click the "Authenticate" button.

To browse or post comments, you must log in.

You cannot post comments as it is outside the comment posting period.

This comment has been deleted. You cannot reply to this comment.

A Comparative Investigation of Continuous-Wave and Pulsed Plasma for Anisotropic Etching of TiO<sub>2</sub> for Metalenses

Manufacturing, Materials and Components

The 32nd International Display Workshops (IDW '25)

Presentation Information

[FMCp1-27L]A Comparative Investigation of Continuous-Wave and Pulsed Plasma for Anisotropic Etching of TiO₂ for Metalenses

Keywords:

Comment

Presentation Information

[FMCp1-27L]A Comparative Investigation of Continuous-Wave and Pulsed Plasma for Anisotropic Etching of TiO2 for Metalenses

Keywords:

Comment

[FMCp1-27L]A Comparative Investigation of Continuous-Wave and Pulsed Plasma for Anisotropic Etching of TiO₂ for Metalenses