Presentation Information
[FMCp1-28L]Etching Characteristics of IGZO in Inductively Coupled Plasmas with Low-GWP Hydrofluorocarbon Gases
*Dae Yeon Ha1, Jong Woo Hong 1, Geun Young Yeom1 (1. Sungkyunkwan University (Korea))
Keywords:
IGZO,Dry etching,C3HxFy,Low GWP
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