Presentation Information

[14]Feasibility Study on Transferring TFT-LCD Positive PFA Photoresist Exposure and Development from Projection to Proximity Lithography Systems

*Kang Long1, Hua Hui Liao1, Feng Liu1, Hui Teng He1, Qing Jiang1, Hui Zhi Song1, Huang Chen I1, James Hsu1, Wade Chen1 (1. Changsha HKC (China))

Keywords:

Positive PFA,Proximity exposure,Projection exposure,Process optimization


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