Presentation Information
[14]Feasibility Study on Transferring TFT-LCD Positive PFA Photoresist Exposure and Development from Projection to Proximity Lithography Systems
*Kang Long1, Hua Hui Liao1, Feng Liu1, Hui Teng He1, Qing Jiang1, Hui Zhi Song1, Huang Chen I1, James Hsu1, Wade Chen1 (1. Changsha HKC (China))
Keywords:
Positive PFA,Proximity exposure,Projection exposure,Process optimization
Comment
To browse or post comments, you must log in.Log in
