Presentation Information
[18]A TCAD-Based Comparative Study of SiO2/SiNx Stacked Gate Dielectric for Enhanced Performance and Reliability in LTPS-TFTs
*Yunfan Shi1, Huichen Xie1, Xingyu Zhou1, Yanqing Guan1, Chao Dai1, Juncheng Xiao1 (1. Wuhan China Star Optoelectronics Semiconductor Display Technology Co., Ltd. (China))
Keywords:
LTPS-TFT,Gate Dielectric,TCAD,SiO2,SiNx
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