Presentation Information
[4]Dual-Ligand-Engineered Quantum Dot Photoresist for High-Resolution Color-Converter(20min.)
*Kuan Chih Lee1 (1. National Tsing Hua University (Taiwan))
Keywords:
Quantum dot photoresist,Ligand engineering,Color conversion,Photolithography,Micro-LED displays
Comment
To browse or post comments, you must log in.Log in
