Session Details
[FMC2]Patterning Technologies for High-Resolution Displays
Thu. Dec 3, 2026 10:50 AM - 12:10 PM JST
Thu. Dec 3, 2026 1:50 AM - 3:10 AM UTC
Thu. Dec 3, 2026 1:50 AM - 3:10 AM UTC
Room 53+54 (5th Floor)
Chair: Shuhei Namekawa (Nippon Steel Chem. & Material)
Co-Chair: Genichi Motomura (NHK)
Co-Chair: Genichi Motomura (NHK)
[1(Invited)]Technologies of the Photosensitive Insulating Materials on TFT Array for LCD(20min.)
*Takao Yashiro1, Eiichiro Urushihara1, Takahide Asaoka1, Akito Naruko1, Koichi Miyachi1 (1. JSR Corporation (Japan))
[2]Luminance-dependent chromaticity shift in Display Devices(20min.)
Peng Le Dang1, *Yan Ling Liu2, Xin Teng3, Hao Mei3, Xue Nan Pan3, Ji Cheng1 (1. Kunshan Govisionox Optoelectronics Co. Ltd. (China), 2. Beijing Visionox Technology Co., Ltd. (China), 3. Hefei Visionox Technology Co., Ltd. (China))
[3(Invited)]Advances in Quantum Dot-Based nanoLED Displays(20min.)
*Yohei Nakanishi1, Shoya Narita1, Yang Qu1, Masayuki Kanehiro1, Takeshi Ishida1 (1. Sharp Corporation (Japan))
[4]Surface-Engineered Quantum Dot Photoresist for Photolithographic Patterning of Color-Conversion Layers(20min.)
*Kuan Chih Lee1 (1. National Tsing Hua University (Taiwan))