Presentation Information
[04pA04I]Environmentally Friendly Chemistry for SiO2 Plasma Etch
Nathan Stafford1, Colin Jennings1, Phong Nguyena1, Igor Rzeplinski2, Goran Bacic1, *Vladislav Gamaleev2, Manh Hung2 (1. American Air Liquide, Inc. (United States of America), 2. Air Liquide Laboratories Innovation Campus Tokyo (Japan))