Presentation Information
[04pA05O]Non-Halogen Atomic Layer Etching of HfO2 by Alternating N2 and O2 Plasma at Room Temperature
*Shih-Nan Hsiao1, Pak-Man Yiu2, Li-Chun Chang2, Jyh-Wei Lee2, Makoto Sekine1, Masaru Hori1 (1. Nagoya University (Japan), 2. Ming Chi University of Technology (Taiwan))