Presentation Information
[04pA10O]Plasma Simulation of HF/CF4 Plasma Generated in Dual-Frequency Chmber for High Aspect Ratio Dielectric Etching for 3D NAND
*Shigeyuki Takagi1, Fumihiko Matsunaga2, Shih-Nan Hsiao3, Yusuke Imai3, Makoto Sekine3 (1. Tokyo University of Technology (Japan), 2. PEGSUS Softwarw Inc., (Japan), 3. Nagoya university (Japan))