Presentation Information
[04pA11O]Studies of Materials and Components for Advanced Nanolithography Using High Brightness 13.5 nm Radiation and Induced Plasma at Ebl2 Research Facility
*Andrey Ushakov1, Herman Bekman1, Lucas Poirier1, Kristell Barthelemy1, Jacqueline van Veldhoven1, Arnold Storm1, Michel van Putten1, Corné Rijnsent1, Youyou Westland1, Peter van der Walle1, Jetske Stortelder1, Aneta Stodólna1, Han Velthuis1, Kleopatra Papamichou1, Véronique de Rooij-Lohmann1, Dirk van Baarle1, Henk Lensen1 (1. TNO (Netherlands))