Plasma Sceience & Technologies 10

10:15 AM - 10:30 AM JST(1:15 AM - 1:30 AM UTC)

[07aA03O] Process Optimization of Ultrathin Titanium Nitride Prepared by Plasma-Enhanced Atomic Layer Deposition As Gate Metal Material

*Lin Kuan-Rong¹, You Jhen-De¹, Yiu Pakman¹ (1. Ming Chi University of Technology (Taiwan))