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Session Details

Invited & OralPlasma Science & Technologies

Plasma Sceience & Technologies 10

Fri. Mar 7, 2025 9:30 AM - 11:30 AM JST
Fri. Mar 7, 2025 12:30 AM - 2:30 AM UTC
Room A(Active Plaza)
Chair:Fan Beam Wu(National United University)
Thin film deposition 2
9:30 AM - 10:00 AM JST(12:30 AM - 1:00 AM UTC)

[07aA01I]Research of High Entropy Alloy Thin Films and their Potential Applications

*Jyh-Wei Lee1,2,3, Bih-Show Lou2,4 (1. Ming Chi University of Technology (Taiwan), 2. Chang Gung University (Taiwan), 3. National Tsing Hua University (Taiwan), 4. New Taipei Municipal TuCheng Hospital (Taiwan))
10:00 AM - 10:15 AM JST(1:00 AM - 1:15 AM UTC)

[07aA02O]Plasma-Deposited Carbon Thin Film for Rigid Gas Permeable Contact Lens Applications

*Shang-Lin Hsieh1, Wen-Pin Lin2,3, Meng-Jiy Wang1 (1. National Taiwan University of Science and Technology (Taiwan), 2. University of Kang Ning (Taiwan), 3. Brighten Optix Corporation Research Center (Taiwan))
10:15 AM - 10:30 AM JST(1:15 AM - 1:30 AM UTC)

[07aA03O]Process Optimization of Ultrathin Titanium Nitride Prepared by Plasma-Enhanced Atomic Layer Deposition As Gate Metal Material

*Lin Kuan-Rong1, You Jhen-De1, Yiu Pakman1 (1. Ming Chi University of Technology (Taiwan))
10:30 AM - 10:45 AM JST(1:30 AM - 1:45 AM UTC)

[07aA04O]Effect of RGPT Process on Properties of Tantlum Oxide Coatings

*Cheng Po Yi1, Li-Chun Chang1 (1. Ming Chi University of Technology (Taiwan))
10:45 AM - 11:00 AM JST(1:45 AM - 2:00 AM UTC)

[07aA05O]Investigation on Cu-xNi/Sn3.5Ag/Cu Full IMC Micro-joint via Thin Film Metallization for 3D-IC Applications

*Ta-Wei Lin1, Shao-Hsuan Chin1, Jenq-Gong Duh1 (1. National Tsing Hua University (Taiwan))
11:00 AM - 11:15 AM JST(2:00 AM - 2:15 AM UTC)

[07aA06O]Stability of Magnesium Oxide on Silicon Substrate ~Theoretical and Experimental~

*Satoru Kaneko1,8, Masahito Kurouchi1, Daishi Shiojiri1, Manabu Yasui1, Masahiko Mitsuhashi1, Ruei Sung Yu2, Shigeo Yasuhara3, Musa Multu Can4, Sumanta Kumar Sahoo5, Mariana Ionita6, Kripasindhu Sadar7, Takashi Tokumasu7, Akifumi Matsuda8 (1. Kanagawa Institute of Industrial Science and Technology (Japan), 2. National Chin-Yi University of Technology (Taiwan), 3. Japan Advanced Chemicals (Japan), 4. Istanbul University (Turkey), 5. Radhakrishna Institute of Technology and Engineering (India), 6. University Politehnica of Bucharest (Romania), 7. Tohoku University (Japan), 8. Tokyo Institute of Technology, (Japan))
11:15 AM - 11:30 AM JST(2:15 AM - 2:30 AM UTC)

[07aA07O]Deposition of Ni Thin Film Using a Multi-Target Plasma Deposition System

*Aurelia Celebre Mechilina1, Aldrin A. Tan1, Alberto V. Amorsolo, Jr.1, Magdaleno R. Vasquez, Jr1 (1. University of the Philippines (Philippines))
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