Presentation Information
[03P-53]Highly conductive n-InN epilayer grown by Plasma-enhanced MOCVD
*Takahiro Gotow1, Tokio Takahashi1, Tetsuji Shimizu1, Naoto Kumagai1, Toshihide Ide1, Hisashi Yamada1 (1. National Institute of Advanced Industrial Science and Technology (Japan))
