Session Details

Poster Session-1

Tue. Mar 3, 2026 5:30 PM - 7:00 PM JST
Tue. Mar 3, 2026 8:30 AM - 10:00 AM UTC
Entrance Hall(Entrance Hall)

[03P-01]Production of High-Density Hydrogen Capacitive Coupled Plasma under a Low Pressure with Hybrid Hollow Electrode Including Magnets for Negative-Ion Sources

*Yasunori Ohtsu1, Kengo Tazume1, Shota Kose1, Md Hasibul Islam1 (1. Saga University (Japan))

[03P-02]Antenna impedance tuning for enhanced power transfer and plasma density using a Faraday shield in inductively coupled plasma

*Hyun Lee1, Unjae Jung1, Woochul Yoon1, Chinwook Chung1 (1. Hanyang University (Korea))

[03P-04]Phase-space distributions of hydrogen atoms emitted from an ECR plasma source

*Motoi Wada1, Yuya Inokuchi1, Takahiro Kenmotsu1 (1. Doshisha University (Japan))

[03P-05]Performance Enhancement of AlGaN/GaN MS-HEMTs Via Synergistic Oxygen Plasma Pre-treatment and TMA Surface Passivation

Zi-Hao Wang1, Chun-Yu Lin1, Liang-Jun Wang1, Shi-Cheng Huang1, Chiao-Yang Cheng1, *Shyh-Jer Huang2, Yi-Chi Lee3, Yan-Kuin Su1 (1. National Cheng Kung University (Taiwan), 2. National Formosa University (Taiwan), 3. Industrial Technology Research Institute (Taiwan))

[03P-06]Characteristics of Plasma Parameters in a Large-Diameter and Low-aspect-ratio RF Plasma Source Using a Spiral Antenna

*Yuya Niimura1, Keigo Kamiuchi1, Takeru Furukawa1, Hiromasa Takeno1 (1. Kobe University (Japan))

[03P-07]Utilizing coupled-cluster and density functional theory for plasma science and its applications

*Youngchoon Park1, Ajith Perera2, Mi-Young Song1, Heechol Choi1 (1. Korea Institute of Fusion Energy (Korea), 2. University of Florida (USA))

[03P-08]Simulation of VHF-CCP in Argon Discharge

*Cho-Jen Yang1, Ping-Yen Hsieh1, Ying-Hung Chen1, Yoshinobu Kawai1,2, Jia-Lin Syu3, Ju-Liang He1 (1. Feng Chia University (Taiwan), 2. Kyushu University (Japan), 3. C SUN Mfg. Ltd. (Taiwan))

[03P-09]Linear Helium Plasma Simulation Employing the Virtual Divertor Model

*Hiroki Natsume1, Satoshi Togo2, Hirohiko Tanaka3, Keiji Sawada4, Noriyasu Ohno3 (1. Tokai University (Japan), 2. University of Tsukuba (Japan), 3. Nagoya University (Japan), 4. Shinshu University (Japan))

[03P-10]Temporal Control of F and O Radicals During Si Etching for Profile Control

*Shuto Tsuchioka1, Tran Trung Nguyen2, Kenichi Inoue2, Takayoshi tsutsumi2, Makoto Sekine2, Kenji Ishikawa2 (1. Graduate School of Engineering Nagoya-uni. (Japan), 2. Center for Low-temperature Plasma Sciences (Japan))

[03P-11]Development of plasma simulations to understand the effects of charge on molecular bonding states

*Kotaro Hamada1, Momoko Shimizu1, Hiroyuki Nishida1, Daisuke Yoshino1 (1. Tokyo university of agriculture and technology (Japan))

[03P-12]Position and voltage dependence of electron temperature and density of He atmospheric-pressure plasma jet by using line intensity ratio

*Tomoya Taguchi1, Wataru Kikuchi1, Jun Enomoto1, Hiroshi Akatsuka1 (1. Institute of Science Tokyo (Japan))

[03P-14]Feature Importance and SHAP-Based Analysis of a Hot Cathode Discharge using a Langmuir Probe

*Arantxa Danielle Montallana1, Magdaleno Jr. Vasquez1, Motoi Wada2 (1. University of the Philippines Diliman (Philippines), 2. Doshisha University (Japan))

[03P-15]Estimation radial profile of DBD plasma jet with the calorimetric methods

*Hiroto Matsuura1, Tatsushi Yano1 (1. Osaka Metropolitan University (Japan))

[03P-16]Spectroscopic characterization of metal wall recycling behavior in deuterium plasma

*Rii Hirao1, Hirohiko Tanaka1, Kakeru Nishimura1, Shin Kajita2, Dogyun Hwangbo3, Noriyasu Ohno1 (1. Nagoya University (Japan), 2. University of Tokyo (Japan), 3. University of Tsukuba (Japan))

[03P-17]Electron Density Measurement via the Dielectric Window of Plasma Reactors with a Surface Wave Probe

*Hee-Jung Yeom1, Mi-Young Song1, Young-Gi Kim1, Dae Chul Kim1, Geunhyeong Park1,2, Jung-Hwa Lee1 (1. Korea Institute of Fusion Energy (Korea), 2. KFE school, University of Science and Technology (Korea))

[03P-18]Development of a Thomson scattering system for spatial profile measurements in an inductively coupled plasma

*Young-Gi Kim1, Jong-Ha Lee1, Geunhyeong Park1,2, H. J. Yeom1, Jung-Hwa Kim1, Hajin Kim1, Hyunyeong Lee1, Jongmin Lee3, Mi-Young Song1 (1. Korea Institute of Fusion Energy (Korea), 2. University of Science and Technology (Korea), 3. Seoul National Univeristy (Korea))

[03P-19]Microplasma Driven by a Microcontroller-Based High-Voltage Module for VOC Discrimination via Plasma Spectroscopy Analysis with Deep Learning

*Po-Chun Chang1, Xiao-Xun Chen1, Cheng-Che Hsu1 (1. National Taiwan University (Taiwan))

[03P-20]Upgrade of the Polychromator APD Module for the KSTAR Thomson Scattering Diagnostic

*Geunhyeong Park1,2, Young-Gi Kim1, Junghwa Kim1, Hajin Kim1, Jong-Ha Lee1,2 (1. Korea Institute of Fusion Energy (Korea), 2. University of Science and Technology (Korea))

[03P-21]Comparison of Absolute Calibration Results Between Integrating Type and Fast Sampling Type Digitizers in KSTAR Thomson Scattering Using a New APD

*Jong-ha Lee1,2, Geunhyeong Park1,2, Young-Gi Kim1, Ha Jin Kim1, Junghwa Kim1, Ichihiro Yamada3 (1. Korea Institute of Fusion (KFE) (Korea), 2. University of Science & Technology (UST) (Korea), 3. National Institute for Fusion Science (NIFS) (Japan))

[03P-22]Experimental and computational analysis of the spatial distribution of B atoms in an inductively coupled BF3 plasma

*Hayato Sato1, Kai Takemura1, Keigo Takeda1 (1. Meijo University (Japan))

[03P-23]Investigation of helium metastable atoms (Hem, 23S1) in atmospheric-pressure discharges

*Hsin Ning Hsu1,2, Bing Shian Chiou1,2, Kun Mo Lin1,2 (1. Department of Mechanical Engineering, National Chung Cheng University (Taiwan), 2. Advanced Institute of Manufacturing with High-tech Innovations, National Chung Cheng University (Taiwan))

[03P-24]Relationship between Gas Flow Dynamics and Emission Propagation of an Atmospheric-Pressure Plasma Jet under an Applied External Electric Field

*Hiromasa Yamada1 (1. National Insititute of Technology, Nagano College (Japan))

[03P-25]Reliable Wafer-Level Diagnostics in Capacitively Coupled Plasma

*Chiwon Choi1, Deokhwan Kim1, Chinwook Chung1 (1. Hanyang University (Korea))

[03P-26]Plasma reheating in discharge-assisted LIBS of kaolinite for heavy metal analysis

*Yubo Zhang1, Huihui Zhu1, Tao Lü1 (1. China University of Geoscience(Wuhan) (China))

[03P-27]Influence of the focal point-to-surface distance on atomic and molecular emission from laser-induced plasma in air

*Huihui Zhu1, Yubo Zhang1, Tao Lü1 (1. China University of Geosciences (Wuhan) (China))

[03P-28]Formation Mechanism of Plasma-Induced Pressure Wave related to the Discharge Intervals

*Keren Ni Dawt Hniang1, Si Thu Han1, Yuhei Yamanaka1, Fumiaki Mitsugi2 (1. Graduate School of Science and Technology, Kumamoto University (Japan), 2. Faculty of Advanced Science and Technology, Kumamoto University (Japan))

[03P-30]Three-dimensional structure reconstruction of plasma emission using multi directional images with a rotationg observation system

*Hayato Yoshikawa1, Ryota Izumi1, Haruka Suzuki1, Hirotaka Toyoda1,2 (1. Nagoya University (Japan), 2. National Institute for Fusion Science (Japan))

[03P-31]Development of an ECR plasma based hydrogen radical source for Hydrogen Attachment/Abstraction Dissociation

*Yuya Inokuchi1, Takahiro Kenmotsu1, Motoi Wada1 (1. Doshisha University (Japan))

[03P-32]A Cathodic-Discharge Approach to Optical Emission Spectroscopy of Solution Plasmas for Multi-Metal Trace Detection

*Hao Yu Wu1, Cheng Che Hsu1 (1. National Taiwan University (Taiwan))

[03P-33]Convolution-Driven Improvement of Spectral Resolution for Multi-Element Detection in Solution Plasma

*Yi-Hsuan Hsieh1, Ching-Yuan Wang1, Cheng-Che Hsu1 (1. National Taiwan University (Taiwan))

[03P-34]Real-time monitoring of metal ion in advanced wet processes using Solution Plasma Optical Emission Spectroscopy

*Ching-Yuan Wang1, Yi-Hsuan Ho1, Cheng-Che Hsu1 (1. National Taiwan University (Taiwan))

[03P-35]The effects of plasma-activated Ringer’s lactate solution on radiation-induced oral mucositis

*Naoka Kouyama1 (1. Nagoya University (Japan))

[03P-36]Exploring the effects of non–thermal plasma on skin wettability: Preliminary implications for biological signal acquisition

Tatsuhiro Esaki1, Akane Suzuki1, Yukino Shinozaki1, *Kenichi Nomura1, Yuki Kagawa1, Maho Yamada2, Kae Nakamura2, Hiromasa Tanaka2, Shinya Toyokuni2, Masaru Hori2, Masaaki Mizuno3 (1. Nihon Kohden Corporation (Japan), 2. Nagoya University (Japan), 3. Nagoya University Hospital (Japan))

[03P-37]Plasma-Induced Dehydrogenative Condensation in Mannitol: Experiment and Numerical Analysis

*Ryosuke Watanabe1, Yoshikazu Hattori2, Takashi Ikuta3, Yuya Haraguchi1, Shinichi Sato4, Tomohide Saio2, Daisuke Yoshino1 (1. Tokyo University of Agriculture and Technology (Japan), 2. Tokushima University (Japan), 3. Keio University (Japan), 4. Tohoku University (Japan))

[03P-38]Interfacial hydroxyl detection by total internal reflection chemifluorescence imaging

*Qi Yang1,2, Jun jie Qiao2, Qing Xiong2, Nozomi Takeuchi1 (1. Institute of Science Tokyo (Japan), 2. Chongqing University (China))

[03P-39]Experiment on Direct Power Generation Using the Plasma Device NAGDIS-II

*Tomoki Maeda1, Hirohiko Tanaka1, Noriyasu Ohno1, Shin Kajita2, Yukihiro Tomita3 (1. Nagoya University (Japan), 2. The University of Tokyo (Japan), 3. Institute of Plasma Physics, Chinese Academy of Sciences (China))

[03P-40]Recovery of Chelated Metal Ions from Water Using a Plasma Microbubble Device

*Wen-Hui Kuan1, Yu-Ching Lin1 (1. Ming Chi University of Technology (Taiwan))

[03P-41]Performance Enhancement of Flexible Asymmetric Supercapacitors Based on Zn–Co Electrodes on Stainless Steel Fiber Paper via Atmospheric-Pressure Plasma Jet Treatment

*Lu-Hong Chen1, I-Chih Ni1, Chih-I Wu1, Shuo-En Yu1, Cheng-Che Hsu1, I-Chun Cheng1, Jian-Zhang Chen1 (1. National Taiwan University (Taiwan))

[03P-43]Plasma-Engineered Plasmonic-Quantum Photothermal Materials for Sustainable Water Harvesting

*Ming-Chieh Hsiao1, Wei-Hung Chiang1 (1. National Taiwan University of Science and Technology (Taiwan))

[03P-44]Plasma-Engineered Universal Anchoring of Single-Atom Catalysts for Multimodal Catalysis

*Tammy Laysandra1, Darwin Kurniawan1, Wei-Hung Chiang1 (1. National Taiwan University of Science and Technology (Taiwan))

[03P-46]Effect of plasma treatment on iron azaphtalocyanine-supported carbon black

*Tsukasa Irie1, Takayuki Ohta1 (1. Meijo University (Japan))

[03P-47]Effects of Atmospheric Pressure Plasma Treatment on Laser-induced Graphene

*John Michael Bartolome1, Bryndell Alcantara1, Aldrin Tan1, Magdaleno Vasquez Jr.1 (1. University of the Philippines - Diliman (Philippines))

[03P-49]Magnetically stabilised gliding arc discharge(GAD) device for CO2 conversion

*Yiqian Li1,2, Xinpei Lu2, Nozomi Takeuchi1 (1. Institute of Science Tokyo (Japan), 2. Huazhong University of Science and Technology (China))

[03P-50]Plasma–ionic liquid hybrid process for CO2 capture and utilization

*Pankaj Attri1, Kazunori Koga1, Hirofumi Kurita2, Takamasa Okumura1, Masaharu Shiratani1 (1. Kyushu University (Japan), 2. Toyohashi University of Technology (Japan))

[03P-51]Low-stress silicon carbide semiconductor films deposited by high-power pulsed magnetron sputtering

*Xu Wen-Yan1 (1. National Yunlin University of Science and Technology (Taiwan))

[03P-52]Crack-free growth of sub-µm-thick CeO2 on mesa-patterned SOI substrates

*Tomohiro Inaba1, Xuejun Xu1, Takehiko Tawara2, Hiroo Omi3, Hideki Yamamoto1, Haruki Sanada1 (1. NTT BRL (Japan), 2. Nihon Univ. (Japan), 3. Yamato Univ. (Japan))

[03P-53]Highly conductive n-InN epilayer grown by Plasma-enhanced MOCVD

*Takahiro Gotow1, Tokio Takahashi1, Tetsuji Shimizu1, Naoto Kumagai1, Toshihide Ide1, Hisashi Yamada1 (1. National Institute of Advanced Industrial Science and Technology (Japan))

[03P-54]Epitaxial Growth of N-polar GaN on N-polar AlN Template by MOVPE

Kaito Fujiwara1, Satoshi Kurai1, *Narihito D. Okada1, Yoichi Yamada1 (1. Yamaguchi Univ. (Japan))

[03P-55]Growth of GaN Channel Layers in N-polar GaN/AlN Structures Using Pulsed TMG Supply

Fumiya Yamanaka1, Aina Hiyama Zazuli1, Taisei Kimoto1, Ryosuke Ninoki1, Amane Hayashiuchi1, Nobuteru Hirata1, Kei Sunai1, Haruka Tokumoto1, Satoshi Kurai1, *Narihito D. Okada1, Yoichi Yamada1 (1. Yamaguchi Univ. (Japan))

[03P-56]Performance enhancement of β-Ga2O3 deep ultraviolet photodetectors fabricated by plasma-assisted pulsed laser deposition with oxygen plasma

Taeyoung Kim1, Yoonsok Kim1, Wonchae Jeong1, *Eun Kyu Kim1 (1. Hanyang University (Korea))

[03P-57]Defect-Controlled Gain and Response Trade-off in Mg-Doped β-Ga2O3 UV Photodetectors by Mist-CVD

*Chien-Sheng Cheng1, Hao-Chung Hung1, Wen-Chau Liu1, Wei-Chou Hsu1 (1. National Cheng Kung University (Taiwan))

[03P-58]Spectral Narrowing in Red InGaN Resonant-Cavity LEDs with Integrated Dielectric and Nanoporous DBRs

*Fan-Jung Meng1, Chia-Feng Lin1 (1. National Chung Hsing University (Taiwan))

[03P-59]Nanoporous GaP Distributed Bragg Reflector (DBR) Integrated with Epitaxial AlGaInP DBR for Bright and Directional Red Light Micro-LEDs

*Chih-Fan Lin1, Chia-Feng Lin1 (1. National Chung Hsing University (Taiwan))

[03P-60]Enhanced Emission and Polarization Control of Green GaN-Based Resonant Cavity LEDs with Nanoporous Distributed Bragg Reflectors.

*Safeer Hussain Rather1 (1. National Chung Hsing University (Taiwan))

[03P-61]Research on the Fabrication of Gallium Oxide Thin-film Transistors by High Power Impulse Magnetron Sputtering

*Yu-Chen Lin1, Jian-Ying Chen1, Sheng-Hui Chen Chen1 (1. National Central University (Taiwan))

[03P-62]Electroluminescence Properties of InGaN-based Red LEDs with Nanorod Array Structure

*Hua-Feng Chang1, Chia-Feng Lin1 (1. National Chung Hsing University (Taiwan))

[03P-66]Underwater Meta-Optics Using GaP Huygens Integrated Resonance Units

Cheng-Ching Chiang1, Ruei-Tzu Duh1, Ray-Hua Horng1, Yao-Wei Huang1, *Ming Lun Tseng1 (1. National Yang Ming Chiao Tung University (Taiwan))

[03P-67]Optical Properties of Blue InGaN Resonant-Cavity LEDs with Nanoporous GaN DBRs and Dielectric DBRs

*Jie-Shin Huang1, Chia-Feng Lin1 (1. National Chung Hsing University (Taiwan))

[03P-68]p-type Layer Forming Method for Ga2O3 and GaN by Applying Ni Implantation and O Plasma Annealing

*Naohiro Shimizu1, Arun Kumar Dhasiyan1, Osamu Oda1, Nobuyuki Ikarashi1, Masaru Hori1 (1. Nagoya University (Japan))

[03P-69]Electrical characterization of Co0.8Fe0.2/In1-xGaxAs contacts for spintronic device applications

*Md Foyshal1, Yufeng Lu1, Md Faysal Kabir1, Jannatul Ferdousy1, Masashi Akabori1 (1. Japan Advanced Institute of Science and Technology (Japan))

[03P-70]Size-dependent magnetic response of ECR-sputtered Fe3O4 micromagnet arrays for spin transistors.

*Jannatul Ferdousy1, Yufeng Lu1, Soh Komatsu1, Md. Faysal Kabir1, Masashi Akabori1 (1. JAIST (Japan))

[03P-71]Wide-bandgap aluminum nitride films deposited by high-power pulsed magnetron reactive sputtering on sapphire substrate

*Yi-Jie Chang1, Hsi-Chao Chen1, Siu-Hui Lee1, Ting-An Jian1, Bo-An Pan1 (1. NYUST (Taiwan))

[03P-72]Raman analysis of high-temperature bias-reactive magnetron sputtering of wide-bandgap silicon carbide semiconductor films

*ZI-LING SHEN1 (1. National Yunlin University of Science and Technology (Taiwan))

[03P-73]Defect level behavior in β-Ga2O3 homoepitaxial films annealed in nitrogen

*Yoshitaka Nakano1, Daiki Katsube2, Takashi Ogawa2, Yukari Ishikawa2, Kohei Sasaki3, Akito Kuramata3 (1. Chubu University (Japan), 2. Japan Fine Ceramics Center (Japan), 3. Novel Crystal Technology (Japan))

[03P-74]Demonstration of Sn δ-doped Dual-Channel ε-Ga2O3/α-Ga2O3 Synaptic MOS-HFET

*Ying Chao1, Han-Wei Chen1, Han-Yin Liu1 (1. National Sun Yat-Sen University (Taiwan))

[03P-75]Study on Flat-band Voltage Control of Power GaN-MIS Device using Floating Gate Structures

*Xigen Li1, Manato Deki1, Hirotaka Watanabe1, Shun Lu1, Jia Wang1, Shugo Nitta1, Yoshio Honda1, Hiroshi Amano1 (1. Nagoya University (Japan))

[03P-77]Electrical and Structural Characteristics of Field-Effect Transistors Based on AlGaN/GaN Stacking Structures

*Shih-Hsuan Chiu1, Chia-Feng Lin1 (1. National Chung Hsing University (Taiwan))

[03P-78]Influence of Substrate Quality on GaN HEMT Behavior: The Case of Sapphire

*Maria Kiran Kocherla1 (1. National Chung Hsing University (Taiwan))

[03P-79]Fabrication and Characterization of IGZO Thin-Film Transistors Using High-Power Impulse Magnetron Sputtering

Taketo Nagata1, Haruya Naganawa2, Kosuke Takenaka2, Yuichi Setsuhara2, *Takayuki Ohta1 (1. Meijo University (Japan), 2. Osaka University (Japan))

[03P-81]Analyzing acoustic wave and UV light applied on SnO2 gas sensor with the model of desorption induced by electronic transitions model

*Yi Ting Pan1, Min Syun Li1, Hua Hsing Liu1, Chieh Fu Hou1, Kuang Yao Lo1 (1. National Cheng Kung University (Taiwan))

[03P-86]Influence of frequency on the polymer surface modification using an atmospheric-pressure microplasma jet

Yuki Taniguchi1, Keita Kunioka1, Tatsuru Shirafuji1, Akimitsu Hatta2, *Jun-Seok Oh1 (1. Osaka Metropolitan University (Japan), 2. Kochi University of Technology (Japan))

[03P-87]Plasma-Engineered Photo-Synergistic Multidimensional Hybrid Matrix for Water and Environmental Purification

*Shuo-Wei Wang1, Wei-Hung Chiang 1 (1. National Taiwan University of Science and Technology (Taiwan))