Presentation Information

[04aB06O]Effects of plasma surface treatment on ferroelectric gate stack in thin-film transistors for memory applications

*Jhao-Fong Deng1, Yen-Lun Hsieh1, Hong-Yi Lu1, Ying-Ju Lai1, Han-Yin Liu1, Chun-Jung Su2,3, William Cheng-Yu Ma1 (1. National Sun Yat-sen University (Taiwan), 2. National Yang Ming Chiao Tung University (Taiwan), 3. Taiwan Semiconductor Research Institute (Taiwan))