Presentation Information
[04aB08O]Influence of HF Adsorption on Cryogenic Reactive Ion Etching of Silicon
*Yusuke Imai1, Shih-Nan Hsiao2, Makoto Sekine2, Takayoshi Tsutsumi2, Kenichi Inoue2, Ryutaro Suda3, Yoshihide Kihara3, Kenji Ishikawa2 (1. Nagoya University (Japan), 2. Center for Low-Temperature Plasma Sciences (Japan), 3. Tokyo Electron Miyagi Ltd. (Japan))