Presentation Information
[04pB13O]Simulation of SiO2 Etching by HF Plasma with Coupled Calculation of Plasma and Surface Reaction
*Shigeyuki Takagi1, Fumihiko Matsunaga2, Shih-Nan Hsiao3, Yusuke Imai3, Makoto Sekine3 (1. Tokyo University of Technology (Japan), 2. PEGSUS Software Inc. (Japan), 3. Nagoya university (Japan))