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Session Details

Invited & OralPlasma Science & Technologies

Plasma Science & Technologies-3

Thu. Mar 5, 2026 9:30 AM - 11:30 AM JST
Thu. Mar 5, 2026 12:30 AM - 2:30 AM UTC
Room B(N201)
Chair:Nozomi Takeuchi(Institute of Science Tokyo)
9:30 AM - 10:00 AM JST(12:30 AM - 1:00 AM UTC)

[05aB01I]Atmospheric-pressure plasma catalysis enables self-organized graphitic pillar growth

*Dae Hoon Lee1, Zulfiqar Ali, Muhammad Majeed, Uyen Nhat Trieu Nguyen, Dao Thi Dung, Seung-Mo Lee, Jeongan Choi, Hohyun Song (1. Korea Institute of Machinery and Materials (Korea))
10:00 AM - 10:15 AM JST(1:00 AM - 1:15 AM UTC)

[05aB02O]Surface modification of high density polyethylene chemical container by atmospheric pressure plasma technique

*Zhen-Gui Yang1, Tzu-Hsiu Hung1, Heng-Yi Chang1,2, Li-Chun Ho2, Fan-Bean Wu1,3 (1. Department of Materials Science and Engineering, National United University , Miaoli, Taiwan. (Taiwan), 2. Amass Magnet Tech Co., Ltd. (Taiwan), 3. Glass and Optical Fiber Research Center, National United University (Taiwan))
10:15 AM - 10:30 AM JST(1:15 AM - 1:30 AM UTC)

[05aB03O]Plasma-engineered Plastics-derived Single-atom Catalysts for Multiapplication

*Po-Tsang Huang1, Wei-Hung Chiang1 (1. National Taiwan University of Science and Technology (Taiwan))
10:30 AM - 10:45 AM JST(1:30 AM - 1:45 AM UTC)

[05aB04O]Plasma-Engineered Universal Anchoring of Single-Atom Catalysts for Multimodal Catalysis

*Tammy Laysandra1, Darwin Kurniawan1, Wei-Hung Chiang1 (1. National Taiwan University of Science and Technology (Taiwan))
10:45 AM - 11:00 AM JST(1:45 AM - 2:00 AM UTC)

[05aB05O]Verification of plasma irradiation conditions to increase the effect of reactive species in plasma CMP

*Yuto Sawayama1,2, Hideo Aida1, Hidetoshi Takeda1, Toshiro Doi3, Masaki Wada2, Chihiro Miyagawa2 (1. Nagaoka University of Technology (Japan), 2. Fujikoshi Machinery Corp. (Japan), 3. Doi Laboratory Inc. (Japan))
11:00 AM - 11:15 AM JST(2:00 AM - 2:15 AM UTC)

[05aB06O]Fabrication of Laser-induced Graphene Decorated with Plasma-reduced Silver for Raman Signal Amplification

*Magdaleno Jr Vasquez1, Pauline Luz Secillano1, Liane Navea1, Aldrin Tan1, Kathrina Lois Taaca1, Arantxa Danielle Montallana1 (1. University of the Philippines Diliman (Philippines))
11:15 AM - 11:30 AM JST(2:15 AM - 2:30 AM UTC)

[05aB07O]Enhancing Plasma Etching Resistance of Aluminum Alloy Using Composite Ceramic Coatings Prepared by Micro-arc Oxidation

*Hsu Shao-Chi1, Hsieh Ping-Yen 1, Chen Ying-Hung1, He Ju-Liang1 (1. Feng Chia University, Taiwan (Taiwan))
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