Oral Session HP2

11:30 AM - 11:50 AM JST(2:30 AM - 2:50 AM UTC)

[HP2-03] Multi-pulse HiPIMS as a New Route to Stable Reactive VO₂ Sputtering

*Erdong Chen¹, Caroline Hain², Daniel Lundin³, Stephanos Konstantinidis⁴, Tetsuhide Shimizu¹ (1. Tokyo Metropolitan University, 2. Empa, Swiss Federal Laboratories for Materials Science and Technology, 3. Plasma & Coatings Physics Division, Linköping Univ., 4. Plasma-Surface interaction Chemistry, Univ. of Mons)