International Symposium on Sputtering & Plasma Processes (ISSP2026)
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Session Details

Oral Presentation3.Pulsed Sputtering and HiPIMS

Oral Session HP2

Thu. Jul 2, 2026 10:40 AM - 12:30 PM JST
Thu. Jul 2, 2026 1:40 AM - 3:30 AM UTC
Oral(Science Hall)
10:40 AM - 11:10 AM JST(1:40 AM - 2:10 AM UTC)

[HP2-01]The high power impulse magnetron sputtering discharge

*Jon Tomas Gudmundsson1,2 (1. University of Iceland, 2. KTH Royal Institute of Technology)
11:10 AM - 11:30 AM JST(2:10 AM - 2:30 AM UTC)

[HP2-02]Microsecond ion flux mapping in HiPIMS via magnetized QCM probe

*Charles Ballage1, Anna Kapran1,2, Ovidiu Vasilovici1, Ahmed Bennacef1,3, Tiberiu Minea1 (1. Laboratoire de Physique des Gaz et Plasmas – LPGP, UMR 8578, Université Paris Saclay, CNRS, 91405, Orsay CEDEX, France, 2. Department of Low Temperature Plasma, Institute of Physics v. v. i., Academy of Sciences of the Czech Republic, Na Slovance 2, 182 21, Prague 8, Czech Republic, 3. Sorbonne Université – Faculté des Sciences et Ingénierie, 75005, Paris, France)
11:30 AM - 11:50 AM JST(2:30 AM - 2:50 AM UTC)

[HP2-03]Multi-pulse HiPIMS as a New Route to Stable Reactive VO₂ Sputtering

*Erdong Chen1, Caroline Hain2, Daniel Lundin3, Stephanos Konstantinidis4, Tetsuhide Shimizu1 (1. Tokyo Metropolitan University, 2. Empa, Swiss Federal Laboratories for Materials Science and Technology, 3. Plasma & Coatings Physics Division, Linköping Univ., 4. Plasma-Surface interaction Chemistry, Univ. of Mons)
11:50 AM - 12:10 PM JST(2:50 AM - 3:10 AM UTC)

[HP2-04]Effects of deposition parameters on microstructure and mechanical behavior of Al0.5CoCrFeNi2Ti0.5 high entropy alloy films

*Chia-Lin Li1, Jyh-Wei Lee1,2,3,4 (1. Center for Plasma and Thin Film Technologies, Ming Chi University of Technology, New Taipei, Taiwan, 2. Department of Materials Engineering, Ming Chi University of Technology, New Taipei, Taiwan, 3. College of Engineering, Chang Gung University, Taoyuan, Taiwan, 4. High Entropy Materials Center, National Tsing Hua University, Hsinchu, Taiwan)
12:10 PM - 12:30 PM JST(3:10 AM - 3:30 AM UTC)

[HP2-05]HIPIMS – Coating technology for a new product generation of cutting tools

*Kenji Fuchigami2, Philipp Immich1, Louis Tegelaers1, Julia Janowitz1, Masaaki Takizawa2 (1. IHI Hauzer Techno Coating B.V., 2. IHI Hauzer Techno Coating Japan)
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