Poster Session (7/1, Wed)

[P1-05] Formation of α-Fe₂O₃ Thin Films by DC Sputtering and Oxygen Annealing: Comparison with RF Sputtering

*Yuta Morimoto¹, Hiroshi Katsumata^1,2 (1. Graduate School of Science and Technology, Meiji University, Kanagawa, Japan, 2. School of Science and Technology, Meiji University, Kanagawa, Japan)