Session Details
Poster Session (7/1, Wed)
Wed. Jul 1, 2026 5:40 PM - 7:10 PM JST
Wed. Jul 1, 2026 8:40 AM - 10:10 AM UTC
Wed. Jul 1, 2026 8:40 AM - 10:10 AM UTC
Room P(Atrium)
[P1-01]Gaseous-Interstitial-Mediated Superstrong Direct Adhesion of Au, Ag, and Cu to Oxide and Nitride Substrates
*Jungheum Yun1, Eunwook Jeung1, Eun-Ae Choi1, Yoshifumi Ikoma2 (1. Korea Institute of Materials Science, 2. Kyushu University)
[P1-02]Narrowing the gap: one step crystallization of atmospheric pressure plasma deposited nitrogen doped TiO2
*Nicolas Fosseur1,2, Stéphane Godet2, François Reniers1 (1. Chemistry of Surfaces, Interfaces and Nanomaterials, Faculty of Sciences, Université libre de Bruxelles, Belgium , 2. 4MAT, Engineering faculty, Université libre de Bruxelles, Belgium)
[P1-03]Aluminum buffer layer influnces on the high-transparency AZO thin films deposited on ITO substrate
*Chaoyang Li1, Sota Yamanaka1, Tao Guo1, Norbert Fruehauf2 (1. Kochi University of Technology, 2. University of Stuttgart)
[P1-04]Effects of Silicon Content on the Microstructural Evolution, Mechanical Properties, and Wear Behavior of Tantalum Silicon Nitride (TaSiN) Thin Films
*Yu Yao Yao1, Fang Bin Wu2 (1. Department of Materials Science and Engineering, National United University, Taiwan, 2. Glass and Optical Materials Research Center, National United University, Taiwan)
[P1-05]Formation of α-Fe2O3 Thin Films by DC Sputtering and Oxygen Annealing: Comparison with RF Sputtering
*Yuta Morimoto1, Hiroshi Katsumata1,2 (1. Graduate School of Science and Technology, Meiji University, Kanagawa, Japan, 2. School of Science and Technology, Meiji University, Kanagawa, Japan)
[P1-06]Substrate temperature dependence of orientation of sp2 clusters in pulsed laser deposited a-C thin films
*Shogo Nagashima1, Jose A. Hernandez Gaitan1, Yoshifumi Aoi1 (1. Department of Materials Chemistry, Faculty of Advanced Science and Technology, Ryukoku University)
[P1-07]Effect of auxiliary magnetic field on electrical and optical properties
of Al-doped ZnO thin films prepared by reactive RF sputtering
*Yilin Wang1, Kunio Okimura1 (1. Graduate School of Engineering, Tokai University)
[P1-08]An innovative and breakthrough route via microwave-induced plasma-enhancement on atomic layer deposited-GaN films
Yihui Lin2,3,1, Yan-Peng Zhou2,3,1, Zhi-Xuan Zhang4, Yu-Quan Zhu5,6, Lijuan Zhou2,3,1, Wei-Hui Wang2,3,1, Jiayuan Chen2,3,1, Yinming Tao2,3,1, Haixiang Huang9, Shui-Yang Lien7,8, *Pao-Hsun Huang2,3,1 (1. School of Ocean Information Engineering, Jimei University, 2. Key Laboratory for Advanced Semiconductor-grade Films, 3. Fujian Provincial Key Laboratory of Oceanic Information Perception and intelligent Processing, 4. College of Physics and Information Engineering, Fuzhou University, 5. Key Laboratory of MEMS of Ministry of Education, 6. School of Integrated Circuits, Southeast University, 7. Xiamen Key Laboratory of Development and Application for Advanced Semiconductor Coating Technology, 8. School of Opto-electronic and Communication Engineering, Xiamen University of Technology, 9. XIAMEN JINGNAI TECH CO., LTD)
[P1-09]Machine Learning Based Prediction of Compositional Characteristics and Film Properties of SiO₂ Thin Films
*Tsukasa Masamoto1, Sukma Wahyu Fitriani1, Yosei Kurosaki1, Yushi Sato1, Kunihiro Kamataki1, Masaharu Shiratani1 (1. Kyushu University)
[P1-10]He-Induced Modification of Film Stress and Surface Morphology in a-C:H Films Deposited by C₂H₂/Ar PECVD
*Shunichi Takahashi1, Kazuki Nagamine1, Daichi Wakita1, Kunihiro Kamataki1, Takamasa Okumura1, Naho Itagaki1, Kazunori Koga1, Masaharu Shiratani1 (1. Graduate School of Information Science and Electrical Engineering, Kyushu University)
[P1-11]Sputter epitaxy of ZnO on c-sapphire using 3D wurtzite MgO buffers with a wide growth-temperature window
*Masanobu Narazaki1, Katsuyuki Harada1, Naoto Yamashita1, Takamasa Okumura1, Kunihiro Kamataki1, Kazunori Koga1, Masaharu Shiratani1, Naho Itagaki1 (1. Kyushu University)
[P1-12]Effects of Sputtering Gas Species and Substrate Heating on the Properties of Ta Thin Films
*Haruno Hasegawa1, Yuya Fujitani1, Midori Kawamura1, Takayuki Kiba1 (1. Division of Applied Chemistry, Kitami Institute of Technology)
[P1-13]Argon incorporation in hafnium nitride thin films prepared at different positions by rf magnetron sputtering
*Tomoaki Osumi1, Yasuhito Gotoh1 (1. Kyoto University)
[P1-14]Layer-by-layer Growth of Highly Oriented Cubic Niobium Nitride by Digitally Processed DC Sputtering at Low Temperature
*Shinichiro Saisho1,2, Hideo Isshiki1 (1. The University of Electro-Communications, 2. Shincron Co.Ltd)
[P1-15]Comparison of factor of merit of thin films of ITO, AZO, ZnO by radiofrecuency sputtering as transparent conductive oxides
*Diana Pineda Vázquez1, Arturo Rodríguez Gómez1 (1. Instituto de Física, Univesidad Nacional Autónoma de México)
[P1-16]Influence of Buffer and Inserting Layers on the Ferroelectricity of Hafnium-Zirconium Oxide Films
Jia-You Zhang1, *Jin-Jie Hong2, Ching-Wei Chen1, Wei-Hsiang Tseng1, Hsiao-Hsuan Hsu3, Chun-Hu Cheng1 (1. National Taiwan Normal University, 2. National Yang Ming Chiao Tung University, 3. National Taipei University of Technology)
[P1-17]Influence of Sodium Tungstate on the Formation Behavior of Micro-Arc Oxidation Coatings on AZ31 Magnesium Alloy
Peng-Shu Hsu1, Shih-Yen Huang1, Kai-Hsiang Yang1, Yu-Ren Chu1, *Yuehlien Lee1 (1. National Taiwan University)
[P1-18]Magnetron sputtering of YBa2Cu3O7-x thin films on biaxially textured flexible substrates (under industrial conditions) in reel-to-reel deposition system
*Raimbek Akhat1, Ivan Veshchunov2, Valery Petrykin2, Zhumabay Bakenov1,3, Sergey Lee2, Aliya Mukanova1,3, Konstantin Vereshchagin2, Marcel Mecko2 (1. Institute of New Materials and Energy Technologies, 2. Faraday Factory Japan LLC, 3. Institute of Batteries, LLC)
[P1-19]Tunable Electrical and Mechanical Properties of Nitrogen-Doped Diamond-Like Carbon Films Synthesized by 60 MHz VHF-PECVD
*Pei-Cheng Jiang1, Chung-Tzu Chang1, Yang-Kuei Fan1, Cheng-Hsun-Tony Chang1 (1. Department of Electronic Engineering, Minghsin University of Science and Technology)
[P1-20]Phase Transition and Electrical Evolution of Nanometer-Scale VSe₂ Thin Films via Low-Energy Nitrogen Ion Beam Doping and Thermal Annealing
*Cheng-Hsun-Tony Chang1, Chung-Tzu Chang1, Pei-Cheng Jiang1 (1. Department of Electronic Engineering, Minghsin University of Science and Technology, Hsinchu, Taiwan.)
[P1-21]Gas flow sputtering deposited very thick molybdenum film
Yi-Ning Chiu1, Ping-Yen Hsieh1, Ying-Hung Chen1, Ralf Bandorf2, *Ju Liang He1 (1. Feng chia university, 2. Fraunhofer Institute for Surface Engineering and Thin Films IST)
[P1-22]Direct deposition of 2D crystalline carbon on insulator substrates using RF magnetron sputtering
*Rion Kikuna1,2, Takeo Nakano1, Katsuhisa Murakami2, Masayoshi Nagao2, Hiromasa Murata2 (1. Seikei University, 2. National Institute of Advanced Industrial Science and Technology (AIST))
[P1-23]Tribological Behavior and Morphological Study of MoS2/ZrN
Composite Coatings Deposited by Magnetron Sputtering
*Ahraf Gulzar1, Shahid Saleem1, M.F Wani1 (1. National Institute of Technology , Srinagar, India)
[P1-24]Field-free magnetization switching driven by interfacial spin orbit torque at all-oxide interface
*Mi-Jin Jin1, Doo-Seung Um3, Jason W. A. Robinson2 (1. Institute for Basic Science (IBS), 2. University of Cambridge, 3. Jeju National University (JNU))
[P1-25]Controlled Oxygen-Induced Property Enhancement in NbMoTaW Based Refractory High Entropy Alloy Films via Alloy Chemistry
*Haris Mukhtar Sheikh1, Mohammad Farooq Wani1, Mukund Dutt Sharma1, Rakesh Sehgal1 (1. National Institute of Technology Srinagar)
[P1-26]Microstructure and Tribology properties of TiVCoCrMnSiₓ High-Entropy Alloy Thin Films Prepared by Magnetron Co-Sputtering
*Jhu-Cyuan Chiang1 (1. National Taiwan University of Science and Technology)
[P1-27]Optimized stacking design in atomic layer deposited Hafnium
zirconium oxide for dielectric and switching devices
*Jhe-Wei Yeh1, Pak-Man Yiu1,2 (1. Department of Materials Engineering, Ming Chi University of Technology, 243 New Taipei City, Taiwan , 2. Center for Plasma and Thin Film Technologies, Ming Chi University of Technology, 243 New Taipei City, Taiwan)
[P1-28]Electrochemical Properties Evaluation of FeNiMoWCrₓ High-Entropy Alloy Thin Films
*Yen-Chin Lai1, Po-Chun Chen1, Bih-Show Lou2,3, Jyh-Wei Lee4,5,6,7 (1. Institute of Materials Science and Engineering, National Taipei University of Technology, Taipei City, Taiwan., 2. Chemistry Division, Center for General Education, Chang Gung University, Taoyuan, Taiwan., 3. Department of Orthopaedic Surgery, New Taipei Municipal TuCheng Hospital, Chang Gung Memorial Hospital, Taiwan., 4. Department of Materials Engineering, Ming Chi University of Technology, New Taipei City, Taiwan., 5. Center for Plasma and Thin Film Technologies, Ming Chi University of Technology, New Taipei, Taiwan., 6. College of Engineering, Chang Gung University, Taoyuan, Taiwan., 7. High Entropy Materials Center, National Tsing Hua University, Hsinchu, Taiwan.)
[P1-29]Plasma Activation and Thermo-Responsive Hydrogel Grafting on Ag–Ca–P Micro-Arc Oxidation Titanium for Hybrid Surface Engineering
*Jiayu Jiang1, Shu-chuan Liao1 (1. Tamkang University)
[P1-30]The effects of arecoline on the corrosion behavior and osseointegration of dental titanium implants treated with atmospheric pressure plasma.
*YingSui Sun1, CHIH-LING HUANG2, WEN-CHIEN WEN-CHIEN,CHEN3, MENG-YUN WU1, Yu-Lin Kuo2 (1. Department of Dental Technology, Taipei Medical University, 2. Department of Mechanical Engineering, National Taiwan University of Science and Technology, 3. Graduate Institute of Biomedical Materials and Tissue Engineering, Taipei Medical University)
[P1-31]Tantalum nitride thin films with nanotextured surfaces prepared by magnetron sputtering are used in dental implant research.
*MENG-YUN WU1, JU-CHEN Li2, SHENG YEN LIN1, YU-ROU LIN3, CING-HUEI YANG1, PARK-MAN Yiu2, YingSui Sun1 (1. Department of Dental Technology, Taipei Medical University, 2. Center for Plasma and Thin Film Technologies, Ming Chi University of Technology-CPTFT, 3. Institute of Oral Tissue Engineering and Biomaterials, National Yang Ming Chiao Tung University)
[P1-32]Hard and tough superlattice films based on non-stoichiometric and disordered diboride layers
*Marek Vidiš1, Tomáš Fiantok1, Martin Truchlý1, Vitalii Izai1, Tomáš Roch1, Leonid Satrapinskyy1, Rainer Hahn2, Helmut Riedl2, Peter Švec3, Viktor Šroba1, Marián Mikula1 (1. Centre for Nanotechnology and Advanced Materials, Comenius University Bratislava, Mlynská Dolina F2, 842 48 Bratislava, Slovakia, 2. Christian Doppler Laboratory for Surface Engineering of high-performance Components, TU Wien, A-1060 Vienna, Austria, 3. Institute of Physics SAS, Dúbravská cesta 9, 845 11 Bratislava, Slovakia)
[P1-33]HiPIMS Fabrication of CrMoNbWTi and CrMoNbTiWC HEA Films: Effects of Ti and C Contents
*HAN-CHIEH CHEN1, Bih-Show Lou2,3, Chia-Lin Li4, Jyh-Wei Lee1,4,5,6 (1. Department of Materials Engineering, Ming Chi University of Technology, New Taipei, Taiwan, 2. Chemistry Division, Center for General Education, Chang Gung University, Taoyuan, Taiwan, 3. Department of Orthopaedic Surgery, New Taipei Municipal TuCheng Hospital, Chang Gung Memorial Hospital, Taiwan, 4. Center for Plasma and Thin Film Technologies, Ming Chi University of Technology, New Taipei, Taiwan, 5. College of Engineering, Chang Gung University, Taoyuan, Taiwan, 6. High Entropy Materials Center, National Tsing Hua University, Hsinchu, Taiwan)
[P1-34]Microstructure, Mechanical Properties, and Corrosion
Resistance of HiPIMS-Deposited AlCrNbSiTiMoNx High Entropy
Alloy Films
*Chang-Yi Jiang1, Chia-Lin Li2, Bih-Show Lou3,4, Jyh-Wei Lee1,2,5,6 (1. Department of Materials Engineering Ming Chi University of Technology, New Taipei, Taiwan, 2. Center for Plasma and Thin Film Technologies, Ming Chi University of Technology, New Taipei, Taiwan, 3. Chemistry Division, Center for General Education, Chang Gung University, Taoyuan, Taiwan , 4. Department of Orthopaedic Surgery, New Taipei Municipal TuCheng Hospital, Chang Gung Memorial Hospital, Taiwan, 5. College of Engineering, Chang Gung University, Taoyuan, Taiwan, 6. High Entropy Materials Center, National Tsing Hua University, Hsinchu, Taiwan)
[P1-35]Microstructures and electrocatalytic properties of FeNiMoWCuC high entropy alloy thin films
*Dai Gao Zheng1, Lee Jyh Wei1,3,5,2, Lou Bih Show4,6, Li Chia Lin3 (1. Ming Chi University of Technology, 2. Chang Gung University, 3. Center for Plasma and Thin Film Technologies, 4. Chang Gung Memorial Hospital, 5. High Entropy Materials Center, National Tsing Hua University, 6. Chemistry Division, Center for General Education, Chang Gung University)
[P1-36]p-Type ZnO Nanorods Grown on Zirconium-Based Metallic Glass Nanotube Arrays for Room-Temperature Gas Sensing
*Guan-Wen Lai1 (1. National Taiwan University of Science and Technology)
[P1-37]Lubricant-Infused Metallic Glass Nanotube Arrays for Slippery and Icephobic Surface Engineering
*Hsiang-Heng Shih1, Jinn P. Chu1 (1. National Taiwan University of Science and Technology)
[P1-38]Oxygen-Free Ti Thin Films Prepared by DC and BP-HPPMS for Non-Evaporable Getter Applications
*Hibiki Kurata1 (1. Seikei University)
[P1-39]Oxygen Plasma-Assisted UV-Grafted of Chitosan Hydrogel on Incorporating Houttuynia cordata Extract on TPU Nonwoven Dressing for Antibacterial and Odor-Control Applications
*ZHI YUN GUO1, Shu Chuan Liao1 (1. Tamkang University)
[P1-40]Atmospheric-Pressure Plasma Jet: A Novel Approach to Boost VRFB Electrode Performance
*YU-LIN KUO1, Ahmad Nur Riza1, Song-Yu Chen2, Yun-Yun Chen1 (1. Natioal Taiwan University of Science and Technology, 2. National I-Lan University)
[P1-41]Green Air-Based Atmospheric Plasma Treatment of PDMS for Rapid Hydrophilization and Improved Biocompatibility
*YunYun Chen1 (1. National Taiwan University of Science and Technology)
[P1-42]Black TiO2 coatings prepared using atmospheric pressure plasma processing
*Hong-Ying Chen1, Li-Yang Lin1, Chun-Yung Huang1 (1. National Kaohsiung University of Science and Technology)
[P1-43]Epitaxial growth of thin VO2 films on TiO2(001) substrates via reactive sputtering with substrate biasing
*Keisuke Kudo1, Md Suruz Mian1, Kunio Okimura1 (1. Tokai university)
[P1-44]Self-sustained electrical oscillations in layered structures of VO₂ films grown on TiN and AZO conductive films
*Rikuto Ura1, Md. Suruz Mian1, Kunio Okimura1 (1. Tokai University)
[P1-45]Characteristics of solar cells using boron carbide films fabricated via magnetron sputtering
*Iori Akimoto1, Yusuke Hayashi1, Shota Ito1, Yushi Suzuki1, Yoshiharu Enta1, Yasuyuki Kobayashi1, Hideki Nakazawa1 (1. Hirosaki University)
[P1-46]Efficiency Enhancement of Microcrystalline Silicon Thin-Film Solar Cells Using an In-situ Two-Step Growth PECVD Process
*Yu-Hung Chen1, Yu-Xin Feng1 (1. Department of Microelectronics Engineering, National Kaohsiung University of Science and Technology (NKUST))