Presentation Information
[P1-27]Optimized stacking design in atomic layer deposited Hafnium
zirconium oxide for dielectric and switching devices
*Jhe-Wei Yeh1, Pak-Man Yiu1,2 (1. Department of Materials Engineering, Ming Chi University of Technology, 243 New Taipei City, Taiwan , 2. Center for Plasma and Thin Film Technologies, Ming Chi University of Technology, 243 New Taipei City, Taiwan)