Presentation Information
[P2-07]Fabrication of vanadium dioxide thin films by reactive high-power pulsed magnetron sputtering with reactive gas-flow switching under constant-power regulation
*Koki Hara1, Kosuke Kasugai1, Naoto Tsushima1, Takeo Nakano1, Suruz Mian2 (1. Seikei University, 2. Tokai University)
