International Symposium on Sputtering & Plasma Processes (ISSP2026)

*Masaomi Sanekata¹, Yuki Nakagawa¹, Hiroki Kobayashi¹, Eisuke Yokoyama^1,2, Masahide Tona³, Hiroaki Yamamoto³, Keizo Tsukamoto³, Kiyokazu Fuke⁴, Keijiro Ohshimo⁵, Fuminori Misaizu⁶ (1. Tokyo Polytechnic University, 2. Salesian Polytechnic, 3. Ayabo Corporation, 4. Kobe University, 5. Hokkaido University of Education, 6. Tohoku University)

*Anna Wiktoria Oniszczuk¹, Afaque Mohammad Hossain², Beniamin Łukianowski¹, Wojciech Gajewski¹, Arutiun Papken Ehiasarian³ (1. TRUMPF Huettinger Sp. z o.o., 2. Trumpf Hüttinger GmbH + Co. , 3. National HIPIMS Technology Centre – UK, Sheffield Hallam University)

*Chen yen wei¹ (1. National Taiwan University of Science and Technology Department of Materials Science and Engineering)

*Guan Ting Chou¹, Fan Bean Wu¹ (1. National United University)

Takeru Korenaga¹, *Takashi Kimura¹ (1. Nagoya Institute of Technology)

Pei-En Fang¹, *Ying Hung Chen¹, Hsieh-Chih Chen², Ping-Yen Hsieh¹, Ju-Liang He¹ (1. Feng chia university, 2. Fu Jen Catholic University)

*Koki Hara¹, Kosuke Kasugai¹, Naoto Tsushima¹, Takeo Nakano¹, Suruz Mian² (1. Seikei University, 2. Tokai University)

*Risako Sekiba¹ (1. Seikei University)

*Ryosuke Matoba¹, Ren Mori¹, Keren Lin¹, Md. Suruz Mian², Takeo Nakano¹ (1. Seikei University, 2. Tokai University)

*Eisuke Yokoyama^1,2, Yuki Nakagawa², Hiroki Kobayashi², Masaomi Sanekata², Masahide Tona³, Hiroaki Yamamoto³, Keizo Tsukamoto³, Kiyokazu Fuke⁴, Keijiro Ohshimo⁵, Fuminori Misaizu⁶ (1. Salesian Polytechnic, 2. Tokyo Polytechnic University, 3. Ayabo Corporation, 4. Kobe University, 5. Hokkaido University of Education, 6. Tohoku University)

*Andrey Kaziev¹, Gleb Lomonosov¹, Dobrynya Kolodko^1,2, Alexander Tumarkin¹, Maksim Kharkov¹ (1. National Research Nuclear University MEPhI, 2. Kotelnikov Institute of Radio Engineering and Electronics, RAS, Fryazino Branch, Fryazino, Russia)

*Chun Hao Cheng^1,2, Yung Chin Yang¹, Chia Lin Li², Bih Show Lou^3,4, Jyh Wei Lee^2,5,6,7 (1. Department of Materials and Mineral Resources Engineering, Institute of Materials Science and Engineering, National Taipei University of Technology, Taipei, Taiwan, 2. Center for Plasma and Thin Film Technologies, Ming Chi University of Technology, New Taipei, Taiwan, 3. Chemistry Division, Center for General Education, Chang Gung University, Taoyuan, Taiwan, 4. Department of Orthopaedic Surgery, New Taipei Municipal TuCheng Hospital, Chang Gung Memorial Hospital, Taiwan, 5. Department of Materials Engineering, Ming Chi University of Technology, New Taipei, Taiwan, 6. College of Engineering, Chang Gung University, Taoyuan, Taiwan, 7. High Entropy Materials Center, National Tsing Hua University, Hsinchu, Taiwan)

*Yuya Eshita¹, Martin Ondryas², Peter Klein², Daniel Lundin³, Tetsuhide Shimizu¹ (1. Tokyo Metropolitan University, 2. Masaryk University, 3. Linköping University)

*Zhong Yun Tsai¹ (1. Department of Materials Engineering Ming Chi University of Technology)

*Anna Kapran^1,2, Charles Ballage¹, Zdeněk Hubička², Tiberiu Minea¹ (1. Laboratoire de Physique des Gaz et Plasmas – LPGP/ CNRS, 2. Department of Low Temperature Plasma, Institute of Physics v. v. i., Academy of Sciences of the Czech Republic)

Kaito Ishikawa¹, *Takashi Kimura¹ (1. Nagoya Institute of Technology)

*Gakuto Kanzaki¹, Junji Miyamoto¹, Kei Somaya¹, Takao Okabe² (1. Graduate School of Daido University Miyamoto.lab, 2. Institute of Industrial Science, The University of Tokyo)

*Takeru Fujiki¹ (1. Tokyo Metropolitan University)

*Taiki Wakabayashi¹, Hidetoshi Komiya¹, Tetsuhide Shimizu¹ (1. Tokyo Metropolitan University)

*Ikuma Masumori¹, Yuji Oshida¹, Tetsuhide Shimizu¹ (1. Tokyo Metropolitan University)

*Anwar Sulaiman Olfion¹, Hayate Nagakura¹, Shimizu Tetsuhide¹ (1. Tokyo Metropolitan University)

*Koki koki Karikomi¹, Koo Bando², Mirei Tokiwa², Yoshihiro Ueoka², Masami Mesuda², Tetsuhide Shimizu¹ (1. Tokyo Metropolitan University, 2. Tosoh Corporation)

*Rina Watabe¹, Erdong Chen¹, Ryuki Yoshitomi¹, Tetsuhide Shimizu¹ (1. Thin-film Process Engineering Laboratory, Tokyo Metropolitan University, Tokyo, Japan.)

*Keren Lin¹, Yuchen Ye², Wataru Kikuchi², Jun Enomoto², Takeo Nakano¹, Hiroshi Akatsuka² (1. Seikei University, 2. Institute of Science Tokyo)

*Mimori Kanno¹, Hiroshi Toyota¹ (1. Hiroshima Institute of Technology)

*Tenma Eto¹, Hiroshi Toyota¹ (1. Hiroshima Institute of Technology)

*Takumi Kawahara¹, Hiroshi Toyota¹ (1. Hiroshima Institute of Technology)

*Chi En Chien¹, Shu Chuan Liao¹ (1. Tamkang University)

*Cao Van Duc Hien¹, Miyamoto Junji¹ (1. Graduate School of Daido University)

*Poramed Wongjom¹ (1. Department of Physics, Faculty of Science and Technology, Thammasat University, Patumtani, 12120, Thailand)

*Chan-Won Park^1,2, Hyo-Chang Lee^3,4, Shin-Jae You¹, Jung-Hyung Kim² (1. Department of Physics, Chungnam National University, 2. Korea Research Institute of Standards and Science, 3. School of Electronics and Information Engineering, Korea Aerospace University, 4. Department of Semiconductor Science, Engineering and Technology, Korea Aerospace University)

*Holak Kim¹, Jeongho Kim¹ (1. Pusan National University)

*Muhammad Raza Zaidi¹, Keiichi Takizawa¹, Takeru Fujiki¹, Hidetoshi Komiya¹, Sebastian Ekeroth², Rommel Paulo B. Viloan Viloan², Robert Boyd², Ulf Helmersson², Tetsuhide Shimizu¹ (1. Tokyo Metropolitan University, 2. linköping university)

*Yung-Sen Lin¹, Gong-Min Zhang¹ (1. Department of Chemical Engineering, Feng Chia University)

*Hsuan Lun Huang¹ (1. National Taiwan University of Science and Technology)

*Yawen Pi¹ (1. National Taiwan University of Science and Technology)

*Taiyo Hirono¹, Md Suruz Mian¹, Kunio Okimura¹, Tomohiko Nakajima², Iwao Yamaguchi² (1. Graduate School of Engineering, Tokai University, 2. National Institute of Advanced Industrial Science and Technology (AIST))

*Venkatesh Narasihman¹, Balaji Gururajan¹, Deveshwar Sasikumar¹, Wei-Sheng Liu¹ (1. Department of Electrical Engineering, Yuan Ze University, Zhongli, Taiwan.)

*Shu Yokoyama¹, Hiroshi Katsumata^1,2 (1. Graduate School of Science and Technology, Meiji University, 2. School of Science and Technology, Meiji University)

*Ryohei Wakayama¹, Md Suruz Mian¹, Kunio Okimura¹ (1. Tokai Univ.)

Soren Anders Tornoe^1,2,3, So Onishi⁴, Hideyuki Kondo⁴, Midori Kawamura⁴, *Nobuhiko Paul Kobayashi^1,2,3 (1. Univerisity of California Santa Cruz, 2. Baskin School of Engineering, 3. Nanostructured Energy Conversion Technology and Research (NECTAR) Lab, 4. Kitami Institute of Technology)

Youssef Ghandaoui¹, Anupama Viswanathan², Abdelali Hammouti¹, Jan Gutwirth², Lucas Deniel¹, Albane Benardais¹, Stanislas Pechev³, Joel Charrier¹, Petr Nemec², *Virginie NAZABAL^1,2 (1. CNRS University of Rennes, 2. University of Pardubice, 3. ICMCB - University of Bordeaux)

*Pin-Yu Chen¹, Yi Long¹ (1. The Chinese University of Hong Kong)

*Deependra Kumar Singh^1,2,3, Govind Gupta^2,4 (1. National Institute of Technology Raipur, India, 2. CSIR-National Physical Laboratory, India, 3. Indian Institute of Science, India, 4. Academy of Scientific & Innovative Research, India)

*Alfreda Krisna Altama¹, Jinn P. Chu² (1. Department of Materials and Metallurgical Engineering, Sepuluh Nopember Institute of Technology (ITS), Surabaya, Indonesia, 2. Department of Materials Science and Engineering, National Taiwan University of Science and Technology, Taipei, Taiwan)