Presentation Information
[P2-12]Reactive sputtering of CrMoNbWxTiCy carbide films by high power impulse magnetron sputtering system: effect of W and carbon contents
*Chun Hao Cheng1,2, Yung Chin Yang1, Chia Lin Li2, Bih Show Lou3,4, Jyh Wei Lee2,5,6,7 (1. Department of Materials and Mineral Resources Engineering, Institute of Materials Science and Engineering, National Taipei University of Technology, Taipei, Taiwan, 2. Center for Plasma and Thin Film Technologies, Ming Chi University of Technology, New Taipei, Taiwan, 3. Chemistry Division, Center for General Education, Chang Gung University, Taoyuan, Taiwan, 4. Department of Orthopaedic Surgery, New Taipei Municipal TuCheng Hospital, Chang Gung Memorial Hospital, Taiwan, 5. Department of Materials Engineering, Ming Chi University of Technology, New Taipei, Taiwan, 6. College of Engineering, Chang Gung University, Taoyuan, Taiwan, 7. High Entropy Materials Center, National Tsing Hua University, Hsinchu, Taiwan)