Presentation Information
[P2-22]Stress Evolution in GaN Thin Films Deposited by HiPIMS:Insights from Plasma Mass Spectrometry
*Koki koki Karikomi1, Koo Bando2, Mirei Tokiwa2, Yoshihiro Ueoka2, Masami Mesuda2, Tetsuhide Shimizu1 (1. Tokyo Metropolitan University, 2. Tosoh Corporation)