International Symposium on Sputtering & Plasma Processes (ISSP2026)
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Tue. Jun 30, 2026
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[P3-01]
Enhancement of Oxygen Robustness in Scandium-doped Aluminum Nitride Films Deposited by RF Sputtering
*Akihiko Teshigahara
1
, Shinya Yoshida
1
(1. Shibaura Institute of Technology)
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