Session Details
Poster Session (7/3, Fri)
Fri. Jul 3, 2026 12:40 PM - 2:40 PM JST
Fri. Jul 3, 2026 3:40 AM - 5:40 AM UTC
Fri. Jul 3, 2026 3:40 AM - 5:40 AM UTC
Room P(Atrium)
[P3-01]Enhancement of Oxygen Robustness in Scandium-doped Aluminum Nitride Films Deposited by RF Sputtering
*Akihiko Teshigahara1, Shinya Yoshida1 (1. Shibaura Institute of Technology)
[P3-02]Semi-Transparent Solar Cells with Oxide/Metal/Oxide(OMO) Electrodes
*HYUN-JUNG JUNG1, Jin Young Kim2, Han-Ki Kim1, Joon Jang1, Ji-Yoon Chae1, Ju Yeong Hong2 (1. Sungkyunkwan university, 2. Seoul National university)
[P3-03]Low Work Function Li-doped SnO2 Thin Films for Efficient Electron Injection in OLEDs
*Ji-Yoon Chae1, Shaozheng Chen1, Joon Jang1, Hyun-Jung Jung1, Da-Eun Lee2, Hwi Kim3, Seungyong Song3, Jeong-Hwan Lee2, Han-Ki Kim1 (1. School of Advanced Materials Science and Engineering, Sungkyunkwan University 2066, Seobu-ro, Jangan-gu, Suwon-si, Gyeonggi-do, Republic of Korea, 2. Department of Materials Science and Engineering, Inha University, Incheon 22212, Republic of Korea, 3. Display Research Center, Samsung Display Co., Ltd., Republic of Korea)
[P3-04]Electrical and Optical Properties of Mo-Sn Co-doped In2O3 Transparent Electrodes for Perovskite/Si Tandem Solar Cells
*Joon Jang1, Shaozheng Chen1, Hyun-Jung Jung1, Ji-Yoon Chae1, Ju Yeong Hong2, Jin Young Kim2, Han-Ki Kim1 (1. Sungkyunkwan University, 2. Seoul National University)
[P3-05]Development of low-reflectance thin film materials for OLED display TFT electrode diffusion barriers
*Mac Kim1 (1. Korea Research Institute of Chemical Technology)
[P3-06]Temporal and Spatial evaluation of laser induced plasma (LIP) aiming to improve the metal nitriding process in air
*Madoka Tachibana1, Eishi Hashiba1, Yoshifumi Kitadate1, Mitsuhiro Hirano1, Naofumi Ohtsu1 (1. Faculty of Engineering, Kitami Institute of Technology)
[P3-07]Characteristics of In-Solution Plasma Polymerization for Polypyrrole Film Deposition
*JeongBin Nam1, Eun Young Jung2, Jae Young Kim1,2, Choon-Sang Park3, Heung-Sik Tae1 (1. School of Electronic and Electrical Engineeing, Kyungpook National University, Daegu 41566,Korea, 2. The Institute of Electronic Technology, College of IT Engineering, Kyungpook National University, Daegu 41566, Korea, 3. Electrical Engineering, Milligan University, Johnson City, TN 37682, USA)
[P3-08]The Effects of Plasma Irradiation on Surface Hardness Distribution of AISI 4135 Steel Nitrided by Open-Air Type Atmospheric-Pressure Plasma Jet
*Otoki Shimizu1, Junji Miyamoto1 (1. Graduate School of Daido University)
[P3-09]Effects of Annealing Atmosphere on the p-type Ni-doped Ga2O3 Thin Films via Reciprocated HiPIMS/RF Co-sputtering
*Ruo-Yan Huang1, Jia-Qi Xu1, Yu-Quan Zhu2, Shui-Yang Lien3, Pao-Hsun Huang1 (1. jimei university, 2. Southeast University, 3. Xiamen University of Technology)
[P3-10]Characterization of High Power Density Pulsed Arc Discharge for Efficiency in the Removal of Persistent Organic Pollutants in Water
*Jorge Aguilar1, Stephen Muhl1, Iván Camps2, Julio César Cruz1, Marco Antonio Martínez1, Hugo Alejandro Hinojosa1, Verónica Cristel Vázquez1 (1. Instituto de Investigaciones en Materiales (IIM) - Universidad Nacional Autónoma de México (UNAM), 2. Tecnológico de Monterrey, Escuela de Ingeniería y Ciencias, Campus Santa Fe, Ciudad de México.)
[P3-11]Magnetron sputtered Ta-W-B refractory alloy coating with composition gradient design for tribological applications
*Wei-Lian Liu1, Pakman Yiu2, Shao-Yu Lu1 (1. Department of Materials Engineering, Ming Chi University of Technology,243 New Taipei City,Taiwan , 2. Center for Plasma and Thin Film Technologies, Ming Chi University of Technology, 243 New Taipei City,Taiwan)
[P3-12]Plasma-Assisted Chlorine Doping of ZnO Thin Films for High-Performance Ultraviolet Photodetectors
*Junyoung Im1, Dong-Geon Lee2, Mi-Jin Jin2, DOOSEUNG UM1 (1. Jeju National University, 2. Institute for Basic Science (IBS))
[P3-13]Combinatorial thin-film deposition via single-cathode powder-target sputtering
*Tamiko Ohshima1, Gaku Yazaki1, Fumiya Shimizu1 (1. Nagasaki Univ.)
[P3-14]A Physics-AI Framework for Efficient Semiconductor Process Optimization and Yield Enhancement
*Daebin Yim1 (1. Sandbox Semiconductor, Inc.)
[P3-15]Effects of Precursor Conditions on Polypyrrole Film Prepared by Using Atmospheric Pressure Plasma Polymerization
*Gyeong Deok Kim1, Eun Young Jung2, Jeong Bin Nam1, Jae Young Kim1,2, Choon-Sang Park3, Heung-Sik Tae1 (1. School of Electronic and Electrical Engineering, College of IT Engineering, Kyungpook National University, Daegu 41566, Korea , 2. The Institute of Electronic Technology, College of IT Engineering, Kyungpook National University, Daegu 41566, Korea, 3. Electrical Engineering, Milligan University, Johnson City, TN 37682, USA)
[P3-16]Fabrication of nanotextured surfaces on AISI 316 stainless steel surface via radio-frequency magnetron argon plasma
*Mitsuhiro Hirano1, Kai Kojima1, Keita Kitazawa1, Naofumi Ohtsu1 (1. Kitami Institute of Technology)
[P3-17]Electrical and Reliability Characteristics of CoAl/Co as Interconnect Metal
*Yi-Lung Cheng1, Yan-Chen Huang1 (1. National Chi-Nan University)
[P3-18]Nondestructive Characterization of Al₂O₃/SiOₓ/Si Passivation Layers via Angle-Resolved XPS and HAXPES
*Wei-Chun Lin1,2, Hsun-Yun Chang3 (1. Department of Photonics, National Sun Yat-sen University, Taiwan, 2. Taiwan Vacuum Society, 3. ULVAC-PHI, Japan)
[P3-19]Enhanced Efficiency in Perovskite Light Emitting Diodes via Energy Level Matched Sputtered NiMgOx Hole Transport Layer
*Shaozheng Chen1, Jihun Kim1, Joon Jang1, Hyun-Jung Jung1, Ji-Yoon Chae1, Bo Ram Lee1, Han-Ki Kim1 (1. Sungkyunkwan University)
[P3-20]Amine-Loaded CuO/ZnO on 3D Metallic Nanotube Arrays for Enhanced Gas-Phase Photocatalytic CO₂-to-Methanol Conversion
*JIA XIONG LEE1 (1. National Taiwan University of Science and Technology)
[P3-21]Specially configured high-pressure residual gas analyzer for measurement of contaminants’ partial pressures in hydrogen plasma sputtering and nanolithography environments
Timo Huijser1, René Koops1, *Andrey Ushakov1, Matheus Martinez Garcia1, Marina Gomes Rachid1, Eleftheria Mavroforaki1, Yke Piesens1, Bert van der Zwan1, Henk Lensen1, Mark van de Kerkhof2 (1. TNO Netherlands Organization for Applied Scientific Research, 2. ASML)
[P3-22]Experimental Study on the Adsorption and Desorption Behavior of Silicon-Based Precursors in Semiconductor Gas Delivery Lines
*Hyeonbin Kim1, Suyeon Kim1, Seeun Kim1, Sunghoon Baek2, Taehee Yeom2, Beomyoo Kim2, Sookyoung Hong2,1, Sungyun Jung2, Bumsuk Jung1 (1. Myoungji University, 2. Samsung Electronics)
[P3-23]Analysis of the Effects of Decomposition Mechanisms of Fluorinated Semiconductor Gases on Removal Efficiency in Plasma-Wet Scrubbers
*Hyeonbin Kim1, Jinwoo Oh1, Dongkyum Kim2, Bumsuk Jung1 (1. Myoungji University, 2. Korea Research Institute of Standards and Science (KRISS))
[P3-24]Evaluation of Electrochromic Properties of WO3 Thin Film by Expanding the applied Voltage Range
*Shunsuke Miyazaki1, Takeo Nakano1, Suruz Mian2 (1. Seikei University, 2. School Of Engineering, Tokai University)
[P3-25]Analysis of the Characteristics and Formation Behavior of Two-layered AlO(OH) Films on Aluminum Alloys Using Sputtering as a Pre-treatment
*Kensuke Kurihara1, Ai Serizawa2 (1. Graduate School of Engineering and Science, Shibaura Institute of Technology, 2. College of Engineering, Shibaura Institute of Technology)
[P3-26]Influence of Atmospheric Pressure Plasma Pre-treatment on the Crystal Size and Thickness of AlO(OH) Films Formed on Aluminum Alloys by the Steam Coating Process
*Ryo Kanno1, Kensuke Kurihara1, Ai Serizawa2 (1. Graduate School of Engineering and Science, Shibaura Institute of Technology, 2. College of Engineering, Shibaura Institute of Technology)
[P3-27]Enhancement of In-Plane Texture and Critical Current via Self-Epitaxy in Sputtered LSMO Thin Films
Deniz Gamze Sanal1, *Marcel Mesko1, Konstantin Vereshchagin1, John Wifred Aclan1, Ivan Veshchunov1, Vladimir Vyatkin1, Valery Petrykin1, Sergey Lee1, Sergey Samoilenkov1 (1. Faraday Factory Japan)
[P3-28]Plasma and Material Information Science–Based Machine Learning for Sputtering and PECVD Processes
*Kunihiro KAMATAKI1, Sukma Wahyu Fitriani1, Tsukasa Masamoto1, Yosei Kurokawa1, Yushi Sato1, Takamasa Okumura1, Naho Itagaki1, Kazunori Koga1, Masaharu Shiratani1 (1. Kyushu University)
[P3-29]Removal effect of metallic and interstitial impurities on mechanical properties of Fe-Ti ingots prepared by hydrogen plasma arc melting
*Jaewon Lim1 (1. Jeonbuk National University)
[P3-30]Effect of Ar Ion Etching on GaN Surfaces in Surface Analysis
*Takahiko Ikarashi1, Asami Yasui1, Chizuru Asahara1, Sara Mizuno1, Haruka Hidaka1, Shinya Yazaki2, Hideaki Mizusaki2, Tomohiro Sakata1 (1. Toray Research Center, Inc., 2. Nagano Prefecture General Industrial Technology Center)
[P3-31]Atmospheric Plasma Activation of LCD 3D-Printed HAp Base Bone Scaffolds for Surface Bioactivity
*HAN-LI LIU1, SHU-CHUAN LIAO1 (1. Tamkang University)
[P3-32]Research on the application of RGD natural biomolecular hydrogels to promote tissue regeneration
*YU-ROU LIN2, Yun-Yun Chen3, MENG-YUN WU1, CING-HUEI YANG1, Yu-Lin Kuo3, YingSui Sun1 (1. Department of Dental Technology, Taipei Medical University, 2. Institute of Oral Tissue Engineering and Biomaterials, National Yang Ming Chiao Tung University, 3. Department of Mechanical Engineering, National Taiwan University of Science and Technology)
[P3-33]Oxygen plasma-enhanced photoresponse in pentacene phototransistors
*Fu-Chiao Wu1, Ren-Jie Wu1, Yueh-Ling Hsu1, Pin-Zhen Chen1, Chun-Jen Wang1, Kai-Lun Su1, Wei-Yang Chou1, Horng-Long Cheng1 (1. National Cheng Kung University)
[P3-34]A novel method for low defect cathodic arc deposited coatings
*dermot patrick monaghan1, Patrick McCarthy1, Joseph Brindley1, James Morgan1 (1. Gencoa Ltd)