Presentation Information
[P3-18]Nondestructive Characterization of Al₂O₃/SiOₓ/Si Passivation Layers via Angle-Resolved XPS and HAXPES
*Wei-Chun Lin1,2, Hsun-Yun Chang3 (1. Department of Photonics, National Sun Yat-sen University, Taiwan, 2. Taiwan Vacuum Society, 3. ULVAC-PHI, Japan)