Presentation Information
[P3-21]Specially configured high-pressure residual gas analyzer for measurement of contaminants’ partial pressures in hydrogen plasma sputtering and nanolithography environments
Timo Huijser1, René Koops1, *Andrey Ushakov1, Matheus Martinez Garcia1, Marina Gomes Rachid1, Eleftheria Mavroforaki1, Yke Piesens1, Bert van der Zwan1, Henk Lensen1, Mark van de Kerkhof2 (1. TNO Netherlands Organization for Applied Scientific Research, 2. ASML)