Oral Session SP2

10:40 AM - 11:10 AM JST(1:40 AM - 2:10 AM UTC)

[SP2-01] Double Ring Magnetron sputtering – superior process control for high-rate, stress-controlled, single-phase AlScN piezoelectric layers and polarity controlled AlN epitaxy

*Elizabeth von Hauff^1,2, Jörg Neidhardt¹, Hagen Bartzsch¹, Stephan Barth¹, Valentin Garbe¹ (1. Fraunhofer Institute for Electron and Plasma Technology, 2. TU Dresden)