[SP2] Oral Session SP2 | International Symposium on Sputtering & Plasma Processes (ISSP2026)

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Oral Presentation2.Sputtering and Plasma Smart Process Technologies

Oral Session SP2

Fri. Jul 3, 2026 10:40 AM - 12:30 PM JST
Fri. Jul 3, 2026 1:40 AM - 3:30 AM UTC

Oral(Science Hall)

10:40 AM - 11:10 AM JST(1:40 AM - 2:10 AM UTC)

[SP2-01]Double Ring Magnetron sputtering – superior process control for high-rate, stress-controlled, single-phase AlScN piezoelectric layers and polarity controlled AlN epitaxy

*Elizabeth von Hauff^1,2, Jörg Neidhardt¹, Hagen Bartzsch¹, Stephan Barth¹, Valentin Garbe¹ (1. Fraunhofer Institute for Electron and Plasma Technology, 2. TU Dresden)

11:10 AM - 11:30 AM JST(2:10 AM - 2:30 AM UTC)

[SP2-02]Microwave-Induced Radical Passivation for High-Quality AlN Thin Films in Atomic Layer Deposition

*Jia-Qi Xu¹, Ruo-Yan Huang¹, Zong-Yue Li¹, Yi-Hui Lin¹, Lijuan Zhou¹, Wei-Hui Wang¹, Haixiang Huang², Guanglei Huang², Shui-Yang Lien³, Pao-Hsun Huang¹ (1. Jimei University, 2. XIAMEN JINGNAI TECH CO., LTD, 3. Xiamen University of Technology)

11:30 AM - 11:50 AM JST(2:30 AM - 2:50 AM UTC)

[SP2-03]Machine Learning–Assisted Monitoring of Al₂O₃/Y₂O₃ Buffer Layers Fabrication in Reel-to-Reel Inline Multi-Chamber Process for 2G-HTS Tape Production

*Deniz Gamze Sanal¹, Marcel Mesko¹, Konstantin Vereshchagin¹, John Wifred Aclan¹, Valery Petrykin¹, Sergey Lee¹, Sergey Samoilenkov¹ (1. Faraday Factory Japan)

11:50 AM - 12:10 PM JST(2:50 AM - 3:10 AM UTC)

[SP2-04]Real-time prediction of industrial vacuum processes and coating quality, via residual gas analysis and AI based diagnostics

dermot patrick monaghan¹, *Dermot Patrick Monaghan¹, Joseph Brindley¹, Oisin Boyle¹, Marcus Law¹, Benoit Daniel¹ (1. Gencoa Ltd)

12:10 PM - 12:30 PM JST(3:10 AM - 3:30 AM UTC)

[SP2-05]Development of Deposition Equipment and Processes for BAW Filters

*Kun Zhang¹, Kazuya Kumabe¹ (1. Technical Development Div., Optorun Co., Ltd.)

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