Oral Session TF2

11:30 AM - 11:50 AM JST(2:30 AM - 2:50 AM UTC)

[TF2-03] Laser induced plasma processing to fabricate a nitride layer on a metal surface utilizing a nitrogen present in air

*Naofumi Ohtsu¹, Madoka Tachibana¹, Eishi Hashiba¹, Yoshifumi Kitadate¹, Mitsuhiro Hirano¹, Takayuki Kiba¹ (1. Kitami Institute of Technology)