International Symposium on Sputtering & Plasma Processes (ISSP2026)
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Session Details

Oral Presentation4.Fundamentals of Thin Films Growth

Oral Session TF2

Wed. Jul 1, 2026 10:40 AM - 12:30 PM JST
Wed. Jul 1, 2026 1:40 AM - 3:30 AM UTC
Oral(Science Hall)
10:40 AM - 11:10 AM JST(1:40 AM - 2:10 AM UTC)

[TF2-01]Real-time monitoring of stress evolution during sputter-deposition of elemental and alloy thin films

*Gregory Abadias1 (1. Institut Pprime)
11:10 AM - 11:30 AM JST(2:10 AM - 2:30 AM UTC)

[TF2-02]Tuning the tungsten thin film phase composition during magnetron sputter deposition

*Farzaneh Farahani1, Diederik Depla1 (1. Gent University)
11:30 AM - 11:50 AM JST(2:30 AM - 2:50 AM UTC)

[TF2-03]Laser induced plasma processing to fabricate a nitride layer on a metal surface utilizing a nitrogen present in air

*Naofumi Ohtsu1, Madoka Tachibana1, Eishi Hashiba1, Yoshifumi Kitadate1, Mitsuhiro Hirano1, Takayuki Kiba1 (1. Kitami Institute of Technology)
11:50 AM - 12:10 PM JST(2:50 AM - 3:10 AM UTC)

[TF2-04]Substantial Improvement of Crystalline Quality in Sputtered Zn1-xMgxO Films on Sapphire Enabled by ZnO(N) Buffers

*Jocelyn Kezia Sutadharma1, Hiroki Otsuyama1, Hibiki Noguchi1, Takamasa Okumura1, Kunihiro Kamataki1, Kazunori Koga1, Masaharu Shiratani1, Naho Itagaki1 (1. Graduate School of Information Science and Electrical Engineering, Kyushu University)
12:10 PM - 12:30 PM JST(3:10 AM - 3:30 AM UTC)

[TF2-05]Plasma Processing Technologies of ULVAC Contributing to the Realization of a Connected Future

*Takehito Jimbo1 (1. ULVAC, Inc.)
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