International Symposium on Sputtering & Plasma Processes (ISSP2026)
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Tue. Jun 30, 2026
Wed. Jul 1, 2026
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5:10 PM - 5:30 PM JST
(8:10 AM - 8:30 AM UTC)
[TF2-10]
Design of Oxide Semiconductor Thin Films Using Reactive Plasma Deposition
*Hisashi Kitami
1
(1. Sumitomo Heavy Industries, Ltd.)
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