[P] P106~P129 Structural Materials

[P127] Molecular Dynamics Simulations of Al₂O₃ Thin Film Formations via Vapor Deposition

○AKARI Nakamura¹, MASAYUKI Okugawa^1,2, AKIHIRO Mitsuhara^1,2, YUICHIRO Koizumi^1,2 (1. Osaka Univ., 2. 3DPTec Integrated Center)

Keywords:

Ceramic Materials,Molecular Dynamics Simulations

We modeled the sputtering deposition of Al₂O₃ thin films using molecular dynamics and investigated how substrate temperature affects the resulting thin-film structure. After examining four types of interatomic potentials, we concluded that the interatomic potential developed by Vashishta et al. was the most appropriate.