[22a-A304-1~10] 6.4 Thin films and New materials

9:00 AM - 9:15 AM JST(12:00 AM - 12:15 AM UTC)

[22a-A304-1] Cu dissolution rate from films synthesized by chelate decomposition process

〇Miwa Onodera¹, Atsushi Nakamura^2,1, Osamu Ito², Yoshinobu Honma³, Atsuko Suzuki³, Katsunori Nakamura⁴, Mirai Yamamura⁴, Keiji Komatsu¹, Takumi Shimomura¹, Hidetoshi Saitoh¹ (1.Nagaoka Univ. Tech., 2.Chubu Chelest Co., Ltd., 3.Honma Corporation, 4.Fujimura Crest CO., LTD.)

Keywords:

chelate decomposition process,Cu films,dissolution rate