[16a-A33-1~11] FS.1 Focused Session "AI Electronics"

10:00 AM - 10:15 AM JST(1:00 AM - 1:15 AM UTC)

[16a-A33-5] Solution concentration dependence of ReRAM using Cu ion-containing PVA as a resistance change layer

〇Yuji Iwasawa¹, Ryota Kobayashi¹, Hiroki Nagai¹, Shinya Aikawa¹ (1.Kogakuin Univ.)

Keywords:

ReRAM,PVA,CuSO4