Presentation Information

[16p-A36-3]Refined Measurement of the Specific Contact Resistivity of Interface between Thermoelectric Semiconductors and Metal with Advanced Transfer Length Method

〇(M1)Akihiro Katsura1, Maki Tsurumoto1, Yukiko Hirose1, Daniele Micucci2, Takashi Sato3,4, Eiji Iwase4, Tohru Sugahara1,4 (1.Kyoto Inst., 2.PoliTo, 3.AIST, 4.Waseda Univ.)
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Keywords:

Interface between Semiconductor and Metal,Contact Resistance,Transfer Length Method


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