[16p-B1-1~14] 13.4 Si processing /Si based thin film / MEMS / Equipment technology

1:15 PM - 1:30 PM JST(4:15 AM - 4:30 AM UTC)

[16p-B1-2] DG poly-Ge TFTs fabricated on glass substrates by using gate last process

〇(M2)Daiki Goshima¹, Akito Kurihara¹, Sho Suzuki¹, Akito Hara¹ (1.Tohoku Gakuin Univ)

Keywords:

Ge,Gate Last,TFT