[16p-C31-1~18] 6.4 Thin films and New materials

1:30 PM - 1:45 PM JST(4:30 AM - 4:45 AM UTC)Presentation by Applicant for JSAP Young Scientists Presentation Award

[16p-C31-2] Evaluation of Work Function for ZrN_xH_y Thin Films Fabricated Using Alternating-Target PLD Method

〇(M2)Daichi Miyazaki¹, Kohei Yoshimatsu¹, Takuto Soma¹, Hiroshi Kumigashira^2,3, Akira Ohtomo¹ (1.Dept. Chem. Sci. Eng., Tokyo Tech., 2.KEK-IMSS, 3.IMRAM, Tohoku Univ.)

Keywords:

nitride hydride,thin film,work function

ZrN_xH_y thin films, which are expected to have a significant work function modulation between ZrN (4.6 eV) and ZrH₂ (3.8 eV), were prepared by target-alternating pulsed laser deposition and the work function was evaluated by surface analysis method. Synchrotron radiation photoemission spectroscopy suggested that hydrogen is selectively substituted for oxygen at the surface of the thin films with larger hydrogen composition. In our talk, we will report the results of work function investigations by Kelvin probe microscopy and ultraviolet photoelectron spectroscopy.