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[16p-D63-17]Reaction kinetics of Single-step Oxidation Loop A and Double-step Oxidation Loop B: Comparison between p-Si(001) and n-Si(001) surfaces

〇Yasutaka Tsuda1, Akitaka Yoshigoe1, Shuichi Ogawa2, Yuji Takakuwa1,3 (1.JAEA, 2.Nihon univ., 3.Tohoku univ.)
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Keywords:

silicon,oxidation,X-ray photoemission spectroscopy


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