Presentation Information
[16p-P08-2]Fabrication of an NV-center diamond pillar probe using thermal etching
〇(M2)Yuma Aoki1, Yifei Wang1, Kunitaka Hayashi1, Dwi Prananto1, Yingshu Ma1, Seong-Woo Kim2, Koji Koyama2, Masashi Akabori1, Toshu An1 (1.JAIST, 2.Orbray Co.)
Keywords:
Quantum sensing,Diamond NV center
This study aims to fabricate NV center diamond pillar probes using the thermal etching method, and to apply them to scanning NV center probes. The use of thermal etching has an advantage in fabricating diamond pillar probes with a high-aspect ratio compared with conventional lithography methods, such as photolithography and electron lithography. The optimization of thermal etching methods, the evaluation of NVs in the fabricated pillar probes, and the performance of the scanning NV probes will be presented.
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