[17a-C32-1~9] 3.14 Silicon photonics and integrated photonics

11:15 AM - 11:30 AM JST(2:15 AM - 2:30 AM UTC)

[17a-C32-9] Investigation of sacrificial layer materials for magneto-optical material integration by μ-transfer printing

〇Kosuke Nakanishi¹, Rai Kou², Yoshikatsu Sutou², Toshiya Murai², Koji Yamada², Yuya Shoji¹ (1.Tokyo Tech., 2.AIST)

Keywords:

transfer printing,isolator,magneto-optical device

It is difficult to achieve high-density integration using conventional magneto-optical device fabrication methods because a thick SGGG remains on Si circuits. Therefore, we focused on the µ-transfer printing (µ-TP) technology, which is a technology for printing thin-film materials. However, the success rate of printing coupons is currently low due to the long removal time of the sacrificial layer. In this research, we investigated the reduction of the sacrificial layer removal time by PE-CVD method. The etching rate is about 24 nm/min faster than before, and we successfully reduced the sacrificial layer removal time.